Asml Netherlands B.v.

Bohang Zhu

Ying Luo

Jan-Gerard Cornelis Van Der Toorn

Yixiang Wang

Allard Eelco Kooiker

Jurgen Van Soest

Shibing Liu

Jeroen Gertruda Antonius Huinck

Han Willem Hendrik Severt

Chia-Yao Chen

Arno Maria Wellink

Wei Fang

Yu Liu

Zhonghua Dong

Lingling Pu

Michael Johannes Christiaan Ronde

Michaël Johannes Christiaan Ronde

Ruochong Fei

Long Di

Xuehui Yin

Nianpei Deng

Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.

Systems and methods for focusing charged—particle beams

Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

Object table comprising an electrostatic clamp

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San Jose, CA, United States of America

Bohang Zhu