Heraeus Quarzglas Gmbh & Co Kg

Bodo Kühn

Bruno Uebbing

Martin Trommer

Stefan Ochs

Stephan Thomas

Steffen Kaiser

Thomas Kayser

Jan Vydra

Matthias Otter

Wolfgang Englisch

Achim Hofmann

Ralf Takke

Rainer Köppler

Maximilian Schmitt

Gero Fischer

Ulla Holst

A method for determining the refractive index profile of a preform is provided. The method involves: preparing the measured deflection angle distribution, including an extreme value determination of the deflection angle distribution, to obtain a prepared deflection angle distribution; transforming the prepared deflection angle distribution into a prepared refractive-index profile; evaluating the prepared refractive-index profile for the fixation of orientation values for the layer radius and for the layer refractive index of a hypothetical refractive index profile; generating a simulated deflection angle distribution on the basis of the hypothetical refractive-index profile with the orientation values, and transforming the deflection angle distribution into a simulated refractive-index profile; fitting the simulated refractive index profile to the prepared refractive-index profile by iterative adaptation of parameters to obtain a fitted, simulated refractive-index profile which is defined by adapted parameters, and obtaining the refractive index profile as the hypothetical refractive-index profile with the adapted parameters.

Method for determining the refractive index profile of a cylindrical optical object, particularly a preform for an optical fiber

A method for producing synthetic quartz glass by fusion of SiOgranulate involves synthesizing amorphous SiOprimary particles, granulating the amorphous SiOprimary particles to form an open-pore SiOgranulate, sintering the open-pore SiOgranulate by heating in a sintering atmosphere at a sintering temperature and for a sintering period to form a densified SiOgranulate, and melting the densified SiOgranulate at a melting temperature to form the synthetic quartz glass. To provide an inexpensive production of low-bubble transparent components of quartz glass despite the use of still open-pore SiOgranulate, the sintering atmosphere, sintering temperature and sintering duration are adjusted such that the densified SiOgranulate still comprises open pores but manifests a material-specific infrared transmission Tat a wavelength of 1700 nm. This transmission is in the range of 50-95% of the infrared transmission Tof quartz glass granules of the same material.

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Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1&#xd7;10molecules/cmto 5.0&#xd7;10molecules/cm, and with a content of SiH groups of less than 5&#xd7;10molecules/cm, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000&#xb0; C.

Optical component of quartz glass, method for producing the optical component, and use thereof

The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties:

Quartz glass blank for an optical component, and manufacturing procedure and use thereof

The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its minimal and maximal hydrogen contents and OH-content, C, C, and C, respectively, with P being the pulse number and &#x3b5; being the energy density (in mJ/cm):[molecules/cm]=1&#xd7;10&#x3b5;,&#x2003;&#x2003;(2)[molecules/cm]=2&#xd7;10&#x3b5;,&#x2003;&#x2003;(3)[wt-ppm]=1,700&#xd7;&#x3b5;[mJ/cm]&#xb1;50.&#x2003;&#x2003;(4)The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses in the course of a homogenization treatment.

The present invention concerns a quartz glass blank for an optical component for the transmission of ultraviolet radiation of a wave length of 250 nm and under, as well as its utilization in microlithography in connection with ultraviolet radiation of a wavelength of 250 nm and under. Such quartz glass blank is to have low induced absorption, while being optimized in respect of compaction and de-compaction. The quartz glass blank according to the invention has the following properties:

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Hanau, Germany

Bodo Kühn