Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno

Technische Universiteit Delft

Bob Van Someren

Pieter Kruit

Adrianus Johannes Petrus Maria Vermeer

Carolus Ida Maria Antonius Spee

Diederik Jan Maas

Axel Sebastiaan Lexmond

Antonie Ellert Duisterwinkel

Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.

Apparatus and method for atomic layer deposition

A method for forming an image of a beam source that during operation provides a beam, and wherein the beam is split so as to divide the beam into beamlets, wherein a redirecting organ is used with which each individual beamlet is redirected to a predetermined degree with the extent of redirection of each beamlet by means of the redirecting organ depending on the distance of that beamlet to a central axis of the beam, such that the beamlets converge in a common point with the beamlets from the beam source being focused to foci located in the redirecting organ, and with the beamlets originating from these foci being focused in the common imaging point.

Method and apparatus for imaging

Growing community of inventors

Rotterdam, Netherlands

Bob Van Someren