Asml Netherlands B.v.

Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Asml Holding N.v.

Other

Bob Streefkerk

Christiaan Alexander Hoogendam

Sjoerd Nicolaas Lambertus Donders

Johannes Catharinus Hubertus Mulkens

Jeroen Johannes Sophia Maria Mertens

Erik Roelof Loopstra

Hans Jansen

Johannes Jacobus Matheus Baselmans

Joeri Lof

Alexander Straaijer

Helmar Van Santen

Klaus Simon

Aleksey Yurievich Kolesnychenko

Antonius Theodorus Anna Maria Derksen

Martinus Hendrikus Antonius Leenders

Erik Theodorus Maria Bijlaart

Timotheus Franciscus Sengers

Joannes Theodoor De Smit

Roelof Aeilko Siebrand Ritsema

Roelof Frederik De Graaf

Michel Riepen

Marcel Mathijs Theodore Marie Dierichs

Jan-Gerard Cornelis Van Der Toorn

Bernardus Antonius Slaghekke

Hans Butler

Hendricus Johannes Maria Meijer

Frank Van Schaik

Patricius Aloysius Jacobus Tinnemans

Marco Koert Stavenga

Henrikus Herman Marie Cox

Herman Boom

Jacobus Johannus Leonardus Hendricus Verspay

Theodorus Marinus Modderman

Franciscus Johannes Herman Maria Teunissen

Felix Godfried Peter Peeters

Arie Jeffrey Den Boef

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Frits Van Der Meulen

Mark Kroon

Martijn Houkes

Sergei Shulepov

Richard Joseph Bruls

Andreas Wurmbrand

Jan Cornelis Van Der Hoeven

Ronald Walther Jeanne Severijns

Gerardus Petrus Matthijs Van Nunen

Cedric Desire Grouwstra

Johannes Henricus Wilhelmus Jacobs

Bernhard Gellrich

Martinus Cornelis Maria Verhagen

Jan Bernard Plechelmus Van Schoot

Marcel Beckers

Hernes Jacobs

Paulus Martinus Maria Liebregts

Paul Graupner

Lejla Seuntiens-Gruda

Nicolaas Rudolf Kemper

Jozef Maria Finders

Franciscus Johannes Joseph Janssen

Paul Graeupner

Richard Moerman

Minne Cuperus

Peter Smits

Adrianus Franciscus Petrus Engelen

Sebastiaan Maria Johannes Cornelissen

Bernard Gellrich

Koen Jacobus Johannes Maria Zaal

Matthew Lipson

Carlo Cornelis Maria Luijten

Ronald A Wilklow

Roel De Jonge

Jan Haisma

Nicolaas Ten Kate

Levinus Pieter Bakker

Huibert Visser

Leon Martin Levasier

Adrianus Hendrik Koevoets

Siegfried Alexander Tromp

Wilhelmus Franciscus Johannes Simons

Erwin John Van Zwet

Noud Jan Gilissen

Juergen Fischer

Bauke Jansen

Borgert Kruizinga

Marcus Martinus Petrus Adrianus Vermeulen

Cédric Désiré Grouwstra

Youri Johannes Laurentius Maria Van Dommelen

Paul Petrus Joannes Berkvens

Christianus Wilhelmus Johannes Berendsen

Peter Paul Steijaert

Robertus Johannes Marinus De Jongh

Henricus Jozef Castelijns

Christiaan Louis Valentin

Marcus Gerhardus Hendrikus Meijerink

Roeland Nicolaas Maria Vanneer

Martinus Hendricus Hendricus Hoeks

Hubertus Antonius Geraets

Peter Schaap

Paul Gräupner

An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets

In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

A projection optical system for an immersion exposure apparatus which exposes a substrate with an illumination light through the projection optical system and a liquid, the projection optical system includes: a plurality of reflective and refractive optical elements through which the illumination light passes, the plurality of reflective and refractive optical elements having a final lens, through which the illumination light passes, the final lens having a light emitting surface through a part of which the illumination light passes, the part of the light emitting surface being in contact with the liquid, wherein the image is projected in a projection region, a center of the projection region is away from an optical axis of the projection optical system with respect to a first direction perpendicular to the optical axis, and a center of the light emitting surface is away from the optical axis with respect to the first direction.

In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.

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Tilburg, Netherlands

Bob Streefkerk