Samsung Electronics Co., Ltd.

I-Sens, Inc.

Bo Kyeong Kang

Hoyoung Kim

Boun Yoon

Jaeseok Kim

Hakhyun Nam

Geun Sig Cha

Gang Cui

Ilyoung Yoon

Chang-Sun Hwang

Sukhoon Jeong

Moon Hee Choi

Fenghua Zhang

Joung Su Lee

Soon Hye Yang

A method of fabricating a semiconductor device includes forming first gate patterns on a semiconductor substrate using an etch mask pattern, forming a trench in the semiconductor substrate between the first gate patterns, forming an insulating layer in the trench, such that the insulating layer fills the trench and is disposed on the etch mask pattern, planarizing the insulating layer until a top surface of the etch mask pattern is exposed, etching a portion of the planarized insulating layer to form a device isolation layer in the trench, forming a second gate layer covering the etch mask pattern and disposed on the device isolation pattern, and planarizing the second gate layer until the top surface of the etch mask pattern is exposed, such that a second gate pattern is formed.

Semiconductor device and method of fabricationg the same

A method of fabricating a semiconductor device comprises: forming an etch stop layer to cover sidewall and top surfaces of first and second dummy gate patterns on a substrate; and forming an interlayer insulating layer on the substrate and the etch stop layer. The interlayer insulating layer is planarized to expose the etch stop layer on the first and second dummy gate patterns, and the etch stop layer is etched to expose the top surfaces and upper sidewall surfaces of the first and second dummy gate patterns, thereby forming a groove between the interlayer insulating layer and the first and second dummy gate patterns. The dummy gate patterns are removed, and gate electrodes are formed in their places.

Methods of fabricating semiconductor devices and semiconductor devices formed thereby

Disclosed relates to an electrochemical determination system of glycated proteins, the system comprising: a filtering means for filtering labeled compounds bound to glycated proteins and non-glycated proteins after adding labeling compounds, capable of selectively binding to the glycated proteins to a solution, in which glycated/non-glycated proteins coexist, to be bound all to the glycated proteins; and a quantifying means for quantifying the filtered labeling compounds, not bound to the glycated proteins. The system of the present invention filters the residual labeled compounds left after binding to glycated proteins to quantify, instead of directly quantifying glycated proteins via the known glycated protein determination methods, thus simplifying the configuration of the system that can provide exact determinations with a low cost. Moreover, the electrochemical determination system of glycated proteins of the present invention minimizes the interference that the proteins are absorbed to an analysis device and a sensor in the system, not using immune antibodies that are expensive and have limited lives and, furthermore, not modifying the electrodes of the electrode sensor with antibodies or enzymes, thus facilitating mass production, quality control and circulation of the products.

Electrochemical determination system of glycated proteins

Growing community of inventors

Seoul, South Korea

Bo Kyeong Kang