Samsung Electronics Co., Ltd.

Bo-Hee Lee

Young-ho Kim

Kyoung-mi Kim

Jae-ho Kim

Mi-ra Park

Jeong-ju Park

A method of manufacturing a semiconductor device using a photolithography process may include forming an anti-reflective layer and a first photoresist film on a lower surface. The first photoresist film may be exposed to light and a first photoresist pattern having a first opening may be formed by developing the first photoresist film. A plasma treatment can be performed on the first photoresist pattern and a second photoresist film may be formed on the first photoresist pattern, which may be exposed to light. A second photoresist pattern may be formed to have a second opening by developing the second photoresist film. Here, the second opening may be substantially narrower than the first opening.

Growing community of inventors

Gunpo-si, South Korea

Bo-Hee Lee