Carl-zeiss-smt Ag

Birgit Kuerz

Wolfgang Singer

Markus Deguenther

Johannes Wangler

Manfred Maul

Daniel Kraehmer

Aksel Goehnermeier

Christoph Zaczek

Alexandra Pazidis

Christoph Menke

Rafael Egger

The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.

Optical device with raster elements, and illumination system with the optical device

A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.

Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus

An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.

Objective with crystal lenses

Growing community of inventors

Aalen, Germany

Birgit Kuerz