Applied Materials, Inc.

Binh Bui

Roger N Anderson

Yu Wen Chang

Aihua Chen

Henry Ho

Steven T Li

Andrew J Ruspini

A wafer support device is provided. The wafer support device includes a susceptor having a surface configured to support a bottom surface of a wafer. The susceptor has a plurality of guiding recesses. The wafer support device also includes a pin lift that has a plurality of pins extending therefrom. The plurality of pins is configured to be passed via the plurality of guiding recesses of the susceptor to engage the bottom surface of the wafer. The susceptor is configured to be moved relative to the plurality of pins in a direction substantially orthogonal to the surface of the susceptor.

Quartz pin lift for single wafer chemical vapor deposition/etch process chamber

An apparatus comprising a semiconductor processing chamber, a plasma generator, and a pipe connecting a semiconductor processing chamber and the plasma generator. The plasma generator includes a generation chamber, a radio frequency generator which generates an ion plasma within the generation chamber, and a magnetic device which confines the plasma primarily within a center region of the generation chamber.

Apparatus and method for generating plasma

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Sunnyvale, CA, United States of America

Binh Bui