Lam Research Corporation

Lam Researh Corporation

Bin Luo

Damien Martin Slevin

Timothy Scott Thomas

Eric H Lenz

Douglas L Keil

Pramod Subramonium

Yukinori Sakiyama

Sean M Donnelly

John Wiltse

Jacob Lee Hiester

Andrew H Breninger

Chunhai Ji

Joseph Lindsey Womack

David William Kamp

Michael John Selep

Allan Matthew Jones

Sam Jafarian Tehrani

Manjesh Shankarnarayana

Matthew B Schick

David James Shusteric

Brian Lewis Ratliff

Bryan Anthony Cmelak

Dave Kamp

Chengzhu Qi

Showerheads for semiconductor processing equipment are disclosed that include various features designed to promote thermal control of the showerhead in high-temperature applications.

Thermally controlled chandelier showerhead

Showerheads for semiconductor processing operations are disclosed that have removable faceplates and various features that provide additional benefit in the context of removable faceplates.

Removable showerhead faceplate for semiconductor processing tools

In some examples, an automated tilting system is provided for adjusting an orientation of a component in a substrate processing chamber. The automated tilting system comprises at least one tilt adjustment motor arranged to cooperate with the component and be connected to a portion of the component by a coupling. The coupling is configured such that automated rotational motion by the at least one tilt adjustment motor imparts corresponding axial movement, relative to the at least one tilt adjustment motor or a datum structure, to the connected portion of the component to adjust the orientation of the component in the processing chamber.

Automated showerhead tilt adjustment

Plasma viewports for high-temperature environments in semiconductor processing equipment are disclosed; such viewports may use a triple-window design, with each window providing particular functionality.

Plasma viewport

Cooling plate for a semiconductor processing apparatus

A showerhead tilt adjustment mechanism is provided which supports a showerhead module in a top plate of a semiconductor substrate processing apparatus, the showerhead tilt adjustment mechanism including a differential screw which provides coarse and fine adjustments to adjust gap/tilt/planarization of a faceplate of the showerhead module with respect to an upper surface of a substrate pedestal module adjacent the faceplate in the semiconductor substrate processing apparatus.

Showerhead tilt mechanism

A carrier ring configured to support a substrate during transport to or from a pedestal of a process tool and surrounding the substrate during processing is defined by, an inner annular portion having a first thickness, the inner annular portion defined to be adjacent a substrate support region of the pedestal; a middle annular portion surrounding the inner annular portion, the middle annular portion having a second thickness greater than the first thickness, such that a transition from a top surface of the inner annular portion to a top surface of the middle annular portion defines a first step; an outer annular portion surrounding the middle annular portion, the outer annular portion having a third thickness greater than the second thickness, such that a transition from the top surface of the middle annular portion to a top surface of the outer annular portion defines a second step.

Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition

Growing community of inventors

Beaverton, OR, United States of America

Bin Luo