Lam Research Corporation

Bill Denty

Rajinder Dhindsa

Duane Outka

Brian K McMillin

Qinghong K Gao

According to one embodiment of the present invention, a method of cleaning one or more fluid plenums of an electrode assembly is provided. According to the method, a plurality of fluid ports in communication with the fluid plenum are isolated and differentiated into respective sets of plenum input ports and plenum output ports. The input and output ports are engaged with respective cleaning fluid couplings. A cleaning fluid is directed through the fluid plenum by creating a fluid pressure differential &#x394;P=P&#x2212;Pacross the plenum input and output ports. The pressure differential &#x394;P is large enough to force cleaning fluid from the cleaning fluid supply duct to the cleaning fluid waste duct through the fluid plenum. Additional embodiments are disclosed and claimed.

Cleaning fixtures and methods of cleaning electrode assembly plenums

A gas distribution apparatus delivers a coolant gas, such as helium, to an upper surface of a chuck for controlling a temperature of a wafer placed on the chuck. The gas distribution apparatus allows first and second zones, such as an inner zone and an outer zone of the chuck, to be supplied with a coolant gas at different pressures for control of the temperature across the wafer. The gas distribution apparatus includes a pressure and flow control system for supplying the coolant gas at selected pressures and bleed lines which provide the dual function of allowing rapid evacuation of the inner and outer zones and preventing excess pressure from one zone from migrating to another zone.

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San Jose, CA, United States of America

Bill Denty