Applied Materials, Inc.

Bharath Kumar Hanchanoor Rathnakara Gowda

Daemian Raj Benjamin Raj

Syed A Alam

Peter Standish

Robert Casanova

Uwe P Haller

Collen Leng

Exemplary semiconductor processing systems may include a gas source coupled with a number of processing chambers. The gas source may include a controller. Each chamber may include an exhaust assembly having a foreline and a pump. The systems may include at least one abatement system coupled with each pump. The systems may include a plurality of exhaust lines that extend between each pump and the abatement system. The systems may include a dilution gas source coupled with each exhaust line. The systems may include a mass flow controller coupled between the dilution gas source and each exhaust line. The systems may include a temperature sensor coupled with each exhaust line between the pump and the abatement system. The temperature sensor may be communicatively coupled with the controller of the gas source, which may control flow of a gas to a chamber based on a measurement from the temperature sensor.

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Cupertino, CA, United States of America

Bharath Kumar Hanchanoor Rathnakara Gowda