Siemens Industry Software Gmbh

Bhamidipati Venkata Rama Samir

Sandip Halder

Kiarash Ahi

Germain Louis Fenger

Bappaditya Dey

Hsin-Wei Wu

Mark Pereira

This application discloses a computing system to obtain a wafer image of an electronic device having physical structures manufactured using one or more lithographic masks associated with a layout design describing the electronic design. The computing system can implement an unsupervised deep learning algorithm to process the wafer image to remove at least some noise from the wafer image, which generates a denoised wafer image. The computing system can extract contours corresponding to the physical structures of the electronic device from the denoised wafer image of the electronic device without use of the layout design or a mask design. The computing system can calibrate the layout design or the mask design describing the one or more lithographic masks based, at least in part, on the contours extracted from the denoised wafer image.

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Bengaluru, India

Bhamidipati Venkata Rama Samir