Samsung Electronics Co., Ltd.

Beung-Keun Lee

Han-Mei Choi

In-Sung Park

Young-Wook Park

Jae-Jong Han

Kyoung-Seok Kim

Myeong-Jin Kim

Eun-Taek Yim

Byung-Kee Kim

Doo-Hyun Hwang

A layer deposition method includes: feeding a reactant with a first flow of an inert gas as a carrier gas into a reaction chamber to chemisorb the reactant on a substrate; feeding the first flow of the inert gas to purge the reaction chamber and a first reactant feed line; and feeding the second flow of the inert gas into the reaction chamber through a feed line different from the first reactant feed line.

Layer deposition methods

The triple-well according to the present invention reduces a photo process forming a well isolation region which is used in a method for forming a prior well. That is, two times of photo processes are reduced to be one time, thereby simplifying a method for forming a triple-well of the DRAM device and reducing time and expenditure.

Semiconductor device having triple-well

Growing community of inventors

Seoul, South Korea

Beung-Keun Lee