Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Chengdu Boe Optoelectronics Technology Co., Ltd.

Beum Ku Park

Rui Zhang

Seungmin Lee

Zhong Lu

Hongguang Yuan

Zhenrui Fan

Duanming Li

Wenxuan Zhang

Kuohua Liao

Li Xiong

A vapor deposition apparatus, including: a reaction device having a reaction chamber; a first gas duct connected to the reaction chamber and configured to direct a process gas into the reaction chamber; a gas ionization device connected to the reaction device and configured to ionize a cleaning gas; and a second gas duct connected to the gas ionization device and configured to direct the cleaning gas into the gas ionization device; a common gas duct; and a three-way control mechanism. An end of the common gas duct is connected to the reaction chamber and the other end of the common gas duct is connected to a first gas port of the three-way control mechanism; the first gas duct and the gas ionization device are connected to a second gas port and a third gas port of the three-way control mechanism, respectively.

Vapor deposition apparatus

Growing community of inventors

Beijing, China

Beum Ku Park