Stmicroelectronics (crolles 2) Sas

Stmicroelectronics S.a.

Koninklijke Philips Corporation N.v.

Stmicroelectronics S.r.l.

Freescale Semiconductor,inc.

Nxp B.v.

Bertrand Borot

Alexandre Ayres

Jean-Francois Carpentier

Charles Baudot

Jean-Robert Manouvrier

Patrick Le Maitre

St&eacute;phane Hanriat

Emmanuel Bechet

Philippe Coronel

Patrick LeMaitre

Michel Zecri

David Turgis

Roberto Maurizio Gonella

Sébastien Fabre

Jean Pierre Schoellkopf

An integrated circuit chip is attached to a support that includes first conductive elements. First conductive pads are located on the integrated circuit chip and are electrically coupled to the first conductive elements by conductive wires. The integrated circuit chip further includes a conductive track. A switch circuit is provided to selectively electrically connect each first conductive pad to the conductive track. To test the conductive wires, a group of first conductive pads are connected by their respective switch circuits to the conductive track and current flow between corresponding first conductive elements is measured.

Electronic device comprising wire links

A three-dimensional integrated structure is formed by a first substrate with first components oriented in a first direction and a second substrate with second components oriented in a second direction. An interconnection level includes electrically conducting tracks that run in a third direction. One of the second direction and third direction forms a non-right and non-zero angle with the first direction. An electrical link formed by at least one of the electrically conducting tracks electrically connected two points of the first or of the second components.

Routing for three-dimensional integrated structures

A semiconductor device may include a semiconductor wafer, and a reference circuit carried by the semiconductor wafer. The reference circuit may include optical DUTs, a first set of photodetectors coupled to outputs of the optical DUTs, an optical splitter coupled to inputs of the optical DUTs, and a second set of photodetectors coupled to the optical splitter. The optical splitter is to be coupled to an optical source and configured to transmit a reference optical signal to the first set of photodetectors via the optical DUTs and the second set of photodetectors.

Semiconductor device and wafer with reference circuit and related methods

A semiconductor chip includes a plurality of superposed semiconductor levels. The semiconductor levels include a plurality of elementary circuits coupled to a common input node. Sensing circuits are coupled to elementary elements of different levels. The outputs of the sensing circuits are used to generate a number, which serves as an identification number of the semiconductor chip.

System for identifying a 3D chip

A coupling module includes optical couplers that are coupled to waveguides. The optical couplers are configured to couple to cores of a multi-core optical fiber. The waveguides each include an external part extending from the module and an internal part extending into the module for connecting the external part to the associated optical coupler. The external part of some of the waveguides extends in a preferential direction, while the external part of others of the waveguides extends in a direction opposite to the preferential direction. The internal parts may include a curved portion configured for forming a turn-back.

Integrated photonic device with improved compactness

Programmable anti-fuse circuitry including at least one anti-fuse cell having a first anti-fuse device coupled between a supply voltage and a first node and a second anti-fuse device coupled between the first node and a ground voltage, and control logic coupled to the first node and arranged to generate a programming voltage having one of at least a first voltage level for breaking-down the first anti-fuse device but not the second anti-fuse device and coupling the first node to the supply voltage; and a second voltage level for breaking-down the second anti-fuse device but not the first anti-fuse device and coupling the first node to the ground voltage.

Anti-fuse element

An anti-fuse cell includes a standard MOS transistor of an integrated circuit, with source and drain regions covered with a metal silicide layer and at least one track of a resistive layer at least partially surrounding the MOS transistor, and adapted to pass a heating current such that the metal of said metal silicide diffuses across drain and/or source junctions.

Anti-fuse cell and its manufacturing process

An integrated circuit includes N configurable cells each including one functional input, one output, one propagation input and one output. The circuit includes a functional mode in which the N configurable cells are coupled by their functional input and their output to logic blocks with which they cooperate to form at least one logic circuit. The disclosed circuit also includes a test mode in which the N configurable cells are coupled by their propagation input and their output to the logic blocks and in which the output of the Nth configurable cell is coupled to a functional input of the first logic block to form an oscillator.

Integrated circuit, system and method including a performance test mode

A memory includes a plurality of memory cells each including a true data input connected to a true bit line and complementary data input connected to a complementary bit line, and two inverters connected head-to-tail firstly to the true data input and secondly to the complementary data input. The memory also includes a test circuit includes a plurality of test cells, each test cell includes a true data input connected to a complementary data input of the preceding test cell and a complementary data input connected to the true data input of the following test cell, the complementary data input of the last test cell being connected to the true data input of the first test cell, each test cell comprising a first inverter connected between the true data input and the complementary data input. The looped chain thus formed propagates a signal whose period is a function of the performance of the storage cells.

Memory including a performance test circuit

An integrated circuit memory of the read-only memory type includes at least one memory cell. Each memory cell includes a storage transistor realized in a semiconductor substrate and presenting a source connected to a reference potential, a gate connected to an electrically conductive word line, and a drain connected to an electrically conductive bit line by an optional connection depending on whether the memory cell is assigned the value 0 or 1. The storage transistor of each memory cell includes a gate formed on the substrate, in the form of a window whose inner contour delimits a central drain region in the substrate, and whose outer contour delimits at least one source region in the substrate.

High density integrated read-only memory (ROM) with reduced access time

A measuring circuit is provided for a memory integrated within a semiconductor device. The measuring circuit includes initializing means and an oscillating loop. The initializing means loadings two complementary values into at least two locations of the memory. The two locations are addressed by a first address and a second address. The oscillating loop comprises a logic circuit for alternatively generating the first address and the second address from data read from the memory so as to successively read data from the first and second memory locations to produce an oscillating signal that has a frequency that depends on internal parameters of the memory. Also provided is a method for qualifying a memory by initializing the memory by loading two complementary values into two locations, and generating an oscillating signal with a frequency that is dependent on internal parameters of the memory.

Measuring circuit for qualifying a memory located on a semiconductor device

A method for forming a resistor of high value in a semiconductor substrate including forming a stack of a first insulating layer, a first conductive layer, a second insulating layer, and a third insulating layer, the third insulating layer being selectively etchable with respect to the second insulating layer; etching the stack, to expose the substrate and keep the stack in the form of a line; forming insulating spacers on the lateral walls of the line; performing an epitaxial growth of a single-crystal semiconductor on the substrate, on either side of the line; selectively removing the third insulating layer to partially expose the second insulating layer at a predetermined location; and depositing and etching a conductive material to fill the cavity formed by the previous removal of the third insulating layer.

SRAM cell

A ROM including memory cells, the programmed cells being formed of a transistor connected between a bit line and a supply potential, the cells being organized in sets of at least one column coupled to one sense amplifier per set. The cell programming is inverted with respect to a desired programming only in specific sets where the desired programming would result in a number of programmed cells greater than the number of unprogrammed cells, the logic state provided by the sense amplifiers associated with the specific sets being inverted.

Growing community of inventors

Le Cheylas, France

Bertrand Borot