Alcatel Lucent

Pfeiffer Vacuum Gmbh

Adixen Vacuum Products

Bertrand Bellet

Julien Bounouar

Arnaud Favre

Cindy Thovex

Nicolas Chapel

Roland Bernard

Erwan Godot

Olivier Le Barillec

Xavier Metais

A measurement station for measuring airborne molecular contamination includes at least one gas analyser, at least two controllable isolation valves connected in parallel to the input of the at least one gas analyser, a conditioning pump, at least two calibrated orifices connected in parallel to the input of the conditioning pump, at least one distributor to connect each controllable isolation valve with, on one side, a sampling line and, on the other side, a calibrated orifice, and a control unit linked to the controllable isolation valves. The control unit commands the opening or the closing of the controllable isolation valves in order to be able to connect the at least one gas analyser with at least one sampling line.

Station and method for measuring airborne molecular contamination

There is provided a device and method for controlling a tightness of at least one transport enclosure for conveyance and atmospheric storage of semiconductor substrates, the transport enclosure including at least two ventilation ports, the device including at least one interface configured to be coupled to the transport enclosure, the interface including at least two connecting heads, at least one connecting head of the heads being formed by a measurement head configured to engage in a ventilation port of the ventilation ports of the transport enclosure, the measurement head including a projecting end piece, opening through at least one aperture, and a peripheral sealing element surrounding the end piece, all of the ventilation ports of the transport enclosure being coupled to the connecting head of the interface. There is also provided a method for controlling the tightness of the transport enclosure.

Device and method for controlling the tightness of a transport enclosure for the conveyance and atmospheric storage of semiconductor substrates

The present invention relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, implemented in a measuring station. The measuring method comprises: The invention also relates to an associated measuring station.

Station and method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure

An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.5&#xd7;d wherein D is the distance between the plane containing the infrared radiation sources and the photomask and d is the distance between the center points of two neighboring infrared radiation sources, and in that the gas injection system comprises a plurality of gas injectors distributed in a plane parallel to the plane of the photomask in such a way that the injectors follow a 90&#xb0; rotational invariance about the center point of the photomask.

Device and method for drying a photomask

The invention concerns a measurement station for the measurement of particle contamination of a transport pod for the conveyance and atmospheric storage of semiconductor substrates, such pod comprising a casing capable of being closed by means of a removable access door, such station comprising: The invention also concerns a method for the measurement of particle contamination of a transport pod for the conveyance and atmospheric storage of semiconductor substrates.

Contamination measurement station and method for a semiconductor substrates transport pod

The subject of the present invention is a method for removing pollution from a confined environment containing an interior space bounded by a wall, involving the following steps: the confined environment which has a leak is placed in a sealed chamber having for example an inlet for introducing a gas and a pump for pumping a gas and the gas contained in the chamber and the gas contained inside the space are simultaneously pumped through the leak so that the pressure difference across the wall is always below a wall damaging threshold. Another subject of the invention is a related device for removing pollution from a confined environment.

Growing community of inventors

Chambery, France

Bertrand Bellet