Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Bert Scheffel

Klaus Goedicke

Christoph Metzner

Siegfried Schiller

Volker Kirchhoff

Jonathan Reschke

Fred Fietzke

Henry Morgner

Jens-Peter Heinss

Wolfgang Hempel

Torsten Werner

Stefan Saager

Matthias Tenbusch

Lars Klose

An apparatus and method for depositing a carbon layer includes an arc discharge is formed between an electron source and an evaporation material by means of a first power supply device. The negative terminal of the first power supply device is connected in an electrically conducting manner to the electron source and the positive terminal of the first power supply device is connected in an electrically conducting manner to the evaporation material. A permanent magnet system and a solenoid coil are arranged in a rotationally symmetrical manner around the evaporation material. The evaporation material is formed as a graphite rod which is surrounded by at least one heat-insulating element at least on the rod end to be evaporated of the graphite rod.

Apparatus and method for depositing hard carbon layers

Method and device for control of a vacuum vaporization process

Method and device for pre-treatment of substrates

The invention relates to a process for stabilizing plasma generation in the coating of large substrate surfaces by means of an electron beam vaporizer. To obtain a stable operation of the apparatus at a high vaporization rate and stable plasma excitation of the vapour cloud without using additional electrodes, according to the invention the vaporization rate of the electron beam vaporizer is initially set so high that at least 10% of the electron beam power is absorbed in the vaporization chamber by the vapour and the optical emission of the resulting plasma is measured. The operating parameters of the electron gun or a process parameter are then controlled in such a way that the optical emission, and therefore the energy absorption, remains constant.

Process for the stabilization of plasma generation by means of electron

A process and apparatus for plasma-activated electron beam vaporization is rovided. The vaporizing material from at least two vaporizer crucibles is vaporized with electron beams. An electric voltage is applied to the vaporizer crucibles in such a way that the vapor-emitting areas serve as electrodes of an electric discharge. The vaporizing material acts as a cathode or anode. The process and apparatus are preferably intended for the reactive coating of large surfaces and for the reactive coating of components, tools and strip steel.

Process and apparatus for plasma-activated electron beam vaporization

Growing community of inventors

Dresden, Germany

Bert Scheffel