Asml Netherlands B.v.

Bert Pieter Van Drieënhuizen

Alexander Matthijs Struycken

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Arno Jan Bleeker

Engelbertus Antonius Fransiscus Van Der Pasch

Jan Bernard Plechelmus Van Schoot

Andrei Mikhailovich Yakunin

Heine Melle Mulder

Andrey Alexandrovich Nikipelov

Paul Van Der Veen

Bert Claessens

Wilfred Edward Endendijk

Willem Jan Bouman

Paul Klatser

Edgar Alberto Osorio Oliveros

Sumant Sukdew Ramanujan Oemrawsingh

Antonius Johannes Maria Montagne

Jozef Ferdinand Dymphna Verbeeck

Marc Hendricus Margaretha Dassen

Thijs Johan Henry Hollink

Jeroen-Frank Dekkers

Marcus Hagting

An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.

Optical device and associated system

A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target () at a plasma formation location () and directing a continuous-wave excitation beam () at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.

Method and apparatus for generating radiation

An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.

Illumination system and lithographic apparatus

A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.

Patterning device

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Veldhoven, Netherlands

Bert Pieter Van Drieënhuizen