Asml Netherlands B.v.

Asml Holding N.v.

Bert Dirk Scholten

Siegfried Alexander Tromp

Yuri Johannes Gabriël Van De Vijver

Thomas Poiesz

Abraham Alexander Soethoudt

Jimmy Matheus Wilhelmus Van De Winkel

Coen Hubertus Matheus Baltis

Sjoerd Nicolaas Lambertus Donders

Erik Henricus Egidius Catharina Eummelen

Lucas Henricus Johannes Stevens

Dirk Willem Harberts

Günes Nakiboglu

Norbertus Josephus Martinus Van Den Nieuwelaar

Jorge Alberto Vieyra Salas

Mark Johannes Hermanus Frencken

Daan Daniel Johannes Antonius Van Sommeren

Johannes Adrianus Cornelis Maria Pijnenburg

Victor Manuel Blanco Carballo

Pieter Lein Joseph Gunter

Stef Marten Johan Janssens

Ronald Frank Kox

David Merritt Phillips

Frederik Antonius Van Der Zanden

Wilhelmus Jacobus Johannes Welters

Marijn Wouters

Laura Maria Fernandez Diaz

Casper Roderik De Groot

Rolf Hendrikus Jacobus Custers

Theresa Mary Spaan-Burke

Peter Mark Overschie

Teunis Van Dam

Andre Bernardus Jeunink

Matthew Lipson

Christopher John Mason

Youssef Karel Maria De Vos

André Schreuder

Justin Johannes Hermanus Gerritzen

Ringo Petrus Cornelis Van Dorst

Evelyn Wallis Pacitti

Arie Cornelis Scheiberlich

Jelmer Mattheüs Kamminga

Damoon Sohrabibabaheidary

Gerhard Albert Ten Brinke

Robby Franciscus Josephus Martens

Dirk Jerome Andre Senden

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

Stage system, lithographic apparatus, method for positioning and device manufacturing method

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.

A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Lithographic apparatus, method for unloading a substrate and method for loading a substrate

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

Substrate holder, a lithographic apparatus and method of manufacturing devices

A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

Lithographic apparatus and a device manufacturing method

A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.

Substrates and methods of using those substrates

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Lithography apparatus, a method of manufacturing a device and a control program

Lithography apparatus and method of manufacturing a device

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Bert Dirk Scholten