Carl Zeiss Laser Optics Gmbh

Carl Zeiss Smt Gmbh

Carl-zeiss-stiftung

Cymer, Inc.

Carl-zeiss-smt Ag

Wmf Gmbh

Bernhard Weigl

Richard L Sandstrom

Holger Muenz

Holger Kierey

Michel Le Maire

Alois Herkommer

Eric Eva

Vitaliy Shklover

Hans-Jochen Paul

Markus Bauer

Willi Anderl

Johannes Kraus

Arno Schmittner

Stephan Joos

Rick Sandstrom

Ann-Kathrin Wandner

Marcus Schmelzeisen

Andreas Kolloch

Johannes Striggow

The disclosure relates to a cooler for use in a device in a vacuum, wherein the partial pressure of the cooling medium in the vacuum environment during the operation of the cooler is less than 10mbar. The cooler includes a heat sink, wherein a cavity through which the cooling medium flows is formed in the heat sink, and wherein the heat sink includes a connection element which surrounds one end of the cavity through which the cooling medium flows. The cooler also includes a connecting piece for joining a coolant line to the cavity. The connecting piece includes a jacket secured on the connection element by a thermal connecting process. An intermediate layer is between the jacket and the connection element. The jacket exerts a force in the direction of the connection element so that the intermediate layer is under compressive stress in the radial direction during operation of the cooler.

Cooler for use in a device in a vacuum

The disclosure relates to an illuminating apparatus for illuminating a sample on a work stage, optionally with a relatively narrow illuminating line of relatively controlled energy, as well as methods for controlling energy of a laser source when illuminating a sample on a work stage with a relatively narrow illuminating line.

Illumination apparatus and method for controlling energy of a laser source

A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers &#x2267;1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra&#x2014;recorded by the at least one detector&#x2014;of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.

Method for measuring a spectrum of a narrowband light source, and spectrometer arrangement

The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.

Optical devices and related systems and methods

An attenuating filter provides a prescribed attenuation of the intensity of transmitted, short-wavelength, ultraviolet light, in particular, at wavelengths below 200 nm, that is governed by a predefinable spatial distribution of its spectral transmittance. The filter has a transparent substrate (), e.g. fabricated from crystalline calcium fluoride. A filter coating () fabricated from a dielectric material that absorbs over a predefined wavelength range is applied to at least one surface () of the substrate. In the case of operating wavelengths of about 193 nm, the filter coating consists largely of tantalum pentoxide. Filters of the type, which may be inexpensively fabricated with high yields, are noted for their high abilities to withstand laser radiation and may be effectively antireflection coated employing simply designed antireflection coatings.

Attenuating filter for ultraviolet light

In a method for mutually aligning a mask pattern formed in a mask,and a substrate,on which the mask pattern is to be imaged, by using setting marks,and,or,in the mask,and in the substrate,the alignment is performed with the aid of an imaging system and a light beam with polarized light,A phase shift for the first diffraction orders,is undertaken in the beam path,Higher diffraction orders,and unwanted light are filtered out after the phase shift, and after the filtering out the light beams of the first diffraction orders,are detected, and the result is evaluated for the purpose of alignment.

Method and device for mutually aligning a mask pattern formed in a mask and a substrate

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Steinheim, Germany

Bernhard Weigl