Robert Boschgmbh

Bernhard Elsner

Franz Laermer

Michael Offenberg

Klaus Heyers

Markus Lutz

Wilhelm Frey

Josef Hirtreiter

Henry Heidemeyer

Karsten Funk

Andrea Schilp

Kurt Weiblen

Eckhard Graf

Heinz-Georg Vossenberg

Horst Munzel

Markus Ohnmacht

Peter Sulzberger

Helmut Skapa

Nicholas Buchan

A method of plasma etching, in particular of anisotropic plasma etching, of laterally defined structures in a silicon substrate, using a process gas, includes having at least one passivating material precipitated on the side walls of the laterally defined structures at least from time to time prior to and/or during etching. In an exemplary method, at least one of the compounds selected from the group ClF, BrF, or IFis added to the process gas as a fluorine-delivering etching gas. In another exemplary method, NFis added to the process gas, at least from time to time, as an additive consuming the passivating material. Finally, in another exemplary method, a light and easily ionizable gas, in particular H, He, or Ne, is added, at least from time to time, to the process gas. The three exemplary methods may be combined.

Methods for plasma etching of silicon

A sensor system for remote detection of a measurable variable includes a sensor, with a first resonator () which has a resonant frequency that is variable under the influence of the measurable variable; an antenna () for sending and receiving a modulated high-frequency signal; a modem () for coupling the first resonator () to the antenna; and a second resonator () that can be excited by a carrier frequency of the high-frequency signal. An interrogation unit generates an inquiry radio signal for exciting the two resonators and interrupts the broadcasting of the inquiry radio signal in order to receive a response radio signal broadcast by the sensor.

Sensor, sensor system, and method for remotely sensing a variable

A sensor system for detecting at least one dimensional variable of a rotating object () includes a plurality of sensors () disposed on the rotating object () that are sensitive to the dimensional variable and an antenna array () for supplying the sensors () with high-frequency energy and for receiving a high-frequency signal, modulated by the variable to be detected, from the sensors (). The sensors are disposed on the object (), distributed in the circumferential direction, and the antenna array () has a directional characteristic () for transmission and/or reception which is stationary with respect to a coordinate system not rotating with the object () and which includes only a subregion () of the object ().

Sensor system for detecting dimensional variables to be measured on a rotating object

A field effect transistor suited for use as a sensor element or in an acceleration sensor is described. For this purpose, the field effect transistor within a planar substrate has a drain area and a source area, which are separated from each other by a channel region. In addition, a gate electrode is provided which is arranged so as to be substantially self-supporting above the substrate over the channel region. The gate electrode is flexibly supported such that an external force acting upon it which has a component acting parallel to the surface of the substrate causes a deflection of the gate electrode parallel to the surface of the substrate. A method is also described in which, in a first method step, an integrated circuit having a drain area, a source area, and a channel region is manufactured or made available in a CMOS process, and thereafter, in a second method step, the substantially self-supporting gate electrode is produced on the integrated circuit using electroplating additive technology.

Field effect transistor, especially for use as a sensor element or acceleration sensor

A coil constructed using the additive technique on the surface of a substrate is characterized in that the conductors of the coil are in contact with an insulating material made at least in part of diamond or diamond-like carbon.

Microcoil

A method for designing and manufacturing a micromechanical device providing a substrate having an anchoring region forming a sacrificial layer on substrate while leaving bare the anchoring region depositing an adhesion layer ( ) on the sacrificial layer ( ) and the anchoring region ( ); forming a mask on the adhesion layer; depositing an electroplating layer on the unmasked region of the adhesion layer; and removing the mask and the sacrificial layer.

Method for designing and manufacturing a micromechanical device

An acceleration sensor has an oscillating structure which is movably suspended on a substrate and can be deflected by an acting acceleration. The acceleration sensor also has an analyzing arrangement detecting a deflection of the oscillating structure due to the acceleration. The oscillating structure and/or the analyzing arrangement are connected to the substrate by mechanical decoupling devices.

Acceleration sensor

A manufacturing method for a micromechanical device. In this method, a substrate is prepared with a plating base area to accommodate an anchoring region, and an adhesive layer is formed and structured on the substrate, so that the anchoring region is formed in the plating base area in the form of a quasi-insular region in a recess of the adhesive layer. The quasi-insular region is connected to the adhesive layer outside of the plated based area by at least one thin web. A mask is formed on the adhesive layer and structured so that the anchoring region and an overgrowth region adjacent to the anchoring region remain unmasked. An electroplated layer is deposited on the unmasked anchoring region so that the overgrowth region is overgrown, and the mask and the part of the adhesive layer that has not been overgrown are removed.

Manufacturing method for a micromechanical device

A method for fabricating metal micropatterns. Trenches are introduced into a polymer layer. These trenches are filled with the metal micropatterns using an electroplating process. Before the deposition of the metal micropatterns, the side walls of the trenches are covered with insulating layers which adhere to the metal micropatterns after the polymer layer is removed.

Method for fabricating metal micropatterns

An acceleration sensing device includes a rotational speed sensor which is mounted on a substrate and detects rotational speed, at least one oscillating structure with a deflectable seismic mass, and an acceleration sensor that detects linear acceleration and has at least one additional seismic mass which is suspended on flexible elements so that it can be deflected. The seismic masses of the two sensors are deflected independently of one another.

Acceleration sensing device

Method of producing acceleration sensors

A suspension or an acceleration sensor having a suspension is proposed, by means of which a micromechanical structure or the acceleration sensor is anchored on a substrate. The suspension takes place by means of lever elements on which an equalizing beam acts. The lever elements are deformed by the stresses in the equalizing beam with respect to the substrate in such a way that the stresses in the microstructure with respect to the substrate are either compensated for or, alternatively, are converted from compressive stresses to tensile stresses or from tensile stresses to compressive stresses.

Suspension for micromechanical structure and micromechanical

A sensor includes a first silicon layer, and a sensor element including at least one electrode structured from the first silicon layer. The sensor also includes at least one connecting element also structured from the first silicon layer. The connecting element has a doping less than the doping of the electrode. The sensor comprises at least one conductor track on the first silicon layer routed over the connecting element and coupled to the sensor element for supplying an external signal.

Growing community of inventors

Huenfelden, Germany

Bernhard Elsner