Carl Zeiss Smt Gmbh

Alcon, Inc.

Wavelight Gmbh

Carl-zeiss-smt Ag

Diehl Munitionssysteme Gmbh & Co. Kg

Diehl Bgt Defence Gmbh Co., Kg

Berndt Warm

Guenther Dengel

Florian Bach

Wolfgang Singer

Damian Fiolka

Markus Hauf

Hubert Holderer

Udo Dinger

Martin Endres

Dirk Heinrich Ehm

Joachim Hartjes

Hartmut Enkisch

Hans-Jürgen Mann

Stefan Schmid

Severin Waldis

Armin Werber

Markus Weiss

Frank Melzer

Alois Herkommer

Daniel Benz

Bastiaan Theodoor Wolschrijn

Peter Martin

Peter Riedel

Claudia Gorschboth

Ralf Stuetzle

Jens Ossmann

Ralf Scharnweber

Raimar Steuer

Stefan Wiesner

Andreas Seifert

Klaus B&auml;r

Andreas Heisler

Stefan Burkart

Stefan Dornheim

Marc Kirch

Franziska Woittennek

Heinz Mann

Dominik Lerm

Jurgen Faltus

Christian Steigerwald

Stefan Koch

Joerg Grampp

Jürgen Baier

Christos Kourouklis

Sigfried Rennon

Günther Dengel

The disclosure provides a system that may provide a virtual object at a first virtual distance to an eye of a patient; may provide a first light wave to the eye; may receive a first perturbed light wave, based at least on the first light wave, from the eye; may determine first optical corrections based at least on the first perturbed light; may provide the virtual object at a second virtual distance to the eye; after providing the virtual object at the second virtual distance, may provide a second light wave to the eye; may receive a second perturbed light wave, based at least on the second light wave, from the eye; may determine second optical corrections based at least on the second perturbed light; and may determine a corrective optical solution for the eye based at least on the first optical corrections and the second optical corrections.

System and method of utilizing computer-aided optics

A lens-sensor array for imaging parts of an eye comprises a lens array disposed onto a sensor array. The lens array transmits a light from a lens towards the sensor array. The lens array comprises a first section configured to direct the light reflected by a first part of the eye to the sensor array, and a second section configured to direct the light reflected by a second part of the eye to the sensor array. The first section comprises first sub-sections, each first sub-section comprising at least one first lenslet. The second section comprises second sub-sections, each second sub-section comprising at least one second lenslet. The sensor array comprises sensors that detect the light from the lens array and generate sensor signals corresponding to the light reflected by the first part of the eye and the light reflected by the second part of the eye.

Imaging multiple parts of the eye

In certain embodiments, a system for performing refractive treatment of an eye comprises a laser, a printer, and a computer. The laser emits a laser beam to prepare the eye for the refractive treatment. The printer prints material onto a print area of a target. The printer comprises a printer head and a printer controller. The printer head directs the material onto the print area, and the printer controller moves the printer head to direct the material onto a specific location of the print area. The computer comprises a memory and processors. The memory stores instructions for a pattern for the target. The pattern is designed to provide the refractive treatment for the eye. The processors instruct the printer controller to move the printer head to print the material onto the print area according to the pattern.

Refractive treatment of an eye by printing material onto a target

An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

Illumination system of a microlithographic projection exposure apparatus having a temperature control device

The present invention relates to a laser apparatus, system, and method for determining a depth of a focus point of a laser beam. An interface device is coupleable to the laser apparatus and has an applanation element comprising a front surface and a back surface. A laser beam having a predefined shape is focussed through the applanation element at a focus point. A superimposed image of a spurious reflection, which is reflected from the front surface of the applanation element, with a standard reflection, which is reflected from the back surface of the applanation element, is detected. The spurious reflection is then filtered out of the superimposed image. Based on the remaining standard reflection, the depth of the focus point of the laser beam can be determined.

Image processing method for determining focus depth of a refractive laser

The disclosure relates to microlithography systems, such as EUV micro-lithography illumination systems, as well as related components, systems and methods.

Microlithography illumination systems, components and methods

Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.

Illumination optics for EUV microlithography and related system and apparatus

A simulator to be used in ophthalmological measurements includes a display apparatus and a control device. The control device is adapted to control the display apparatus in such a manner that the display apparatus displays an image that is adapted to simulate the arrangement of a pupillary midpoint relative to a reference structure.

Simulator for use in ophthalmological measurements

An optical element includes first regions which reflect or transmit the light falling on the optical element. The optical element also includes second regions which are in each instance separated by a distance from a first region and which at least partially surround a first region. The second regions are designed to be at least in part electrically conductive and are electrically insulated from the first regions. The optical element includes a carrier element and at least two first regions in the form of mirror facets which are arranged on the carrier element. The second regions are arranged with a separation from the mirror facets on the carrier element and are electrically insulated against the carrier element as well as against the mirror facet. At least one mirror facet is surrounded by an electrically conductive second region.

Optical element with at least one electrically conductive region, and illumination system with the optical element

An apparatus for processing material with focused electromagnetic radiation, comprises: a source emitting electromagnetic radiation, means for directing the radiation onto the material, means for focusing the radiation on or in the material, a unit for generating a pattern in the optical path of the electromagnetic radiation, an at least partially reflective surface in the optical path before the focus of the focused radiation, said pattern being imaged onto said at least partially reflective surface through at least part of said directing means and said focusing means, at least one detector onto which an image of the pattern is reflected by said surface and which generates electrical signals corresponding to said image, said image containing information on the position of the focus, a computer receiving said electrical signals and programmed to process said image so as to generate an electrical signal depending on the focal position, and a divergence adjustment element arranged in said optical path and adapted to receive said electrical signal of the computer so as to change a divergence of the electromagnetic radiation depending on said signal.

Apparatus and method for processing material with focused electromagnetic radiation

The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods.

Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection exposure apparatuses provided with such illumination systems, related methods of manufacturing microstructured elements, and microstructured elements obtained by these methods.

Illumination optics for projection microlithography

A facet mirror () is provided with a number of mirror facets (), in which the mirror facets () respectively have a spherical or conical facet body () with a reflecting surface (). The side of the facet body () averted from the reflecting surface () is mounted in a bearing device ().

Facet mirror having a number of mirror facets

A deformable mirror ( ) with an at least quasi-continuously deformable optically effective surface ( ) has a floatingly supported mirror plate ( ) which is positioned along its edge by a portion of the adjusting members ( ), whereas the other portion of the adjusting members ( ) locally individually deforms the mirror plate ( ) for the purposes of wave front correction. In that respect all adjusting members ( ) are fixed to the rear side ( ) of the mirror plate ( ), with a coupling portion ( ) which is provided with a desired-flexion location (constriction ( )).

Deformable mirror

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Berndt Warm