W.c. Heraeus Gmbh & Co Kg

Bernd Stenger

David Francis Lupton

Ralf Heck

Oliver Warkentin

Harald Manhardt

Marek Gorywoda

Holger Zingg

Wolfram Graf

Rainer J&uuml;ttner

Wolfgang Jablonski

Peter Mainz

Egon Maier

A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.

Hollow cylindrical cathode sputtering target and process for producing it

A process for producing a tube target for cathode sputtering plants, in which the tube target is formed from a metallic inner tube (target holder) made of a first material with a first melting point of T &gE;900 K and a metallic outer tube (target) that concentrically surrounds the inner tube and that is made of a second material with a second melting point of T &lE;800 K. The inside diameter of the outer tube and the outside diameter of the inner tube are proportioned in such a way that the two tubes fit together tightly and are mechanically firmly joined. The outer tube is formed by casting the second material in a molten state in a heated, vertical, cylindrical permanent mold, which has a heated mandrel that constitutes the inner tube. After a space between the mold and the inner tube has been filled with the molten second material, a first thermal gradient develops between the inner tube and the mold, a second thermal gradient develops between the bottom and the top of the mold, and the outer tube is simultaneously cooled from the inside to the outside and from the bottom to the top.

Process for producing a tube-shaped cathode sputtering target

A process for making an indium-tin-oxide shaped body, comprising: (a) filling an indium-tin-oxide powder into a first flexible mold, the indium-tin-oxide powder having a specific BET surface of at most 3 m.sup.2 /g with a mean primary particle size of 0.03 .mu.m to 1.0 .mu.m and/or having a density of at least 40% of theoretical density after cold pressing at a pressure of 100 MPa and/or the indium-tin-oxide powder being made by reacting at least two reaction partners comprising a molten indium-tin-metal alloy as a first reaction partner and oxygen as a second reaction partner in a plasma arc in a plasma chamber provided with an inlet opening for the reaction partners and an outlet with a gas-supply device to obtain a material, and quenching the material at the outlet opening of the plasma chamber with a gas stream which cools the material at a cooling rate of 10.sup.5 K/s to 10.sup.8 K/s to +50.degree. C. to +400.degree. C.; (b) cold pressing the indium-tin-oxide powder at a minimum pressure of 100 MPa; (c) placing the cold compact released from the first mold in a ceramic powder in a second mold, the ceramic powder having a maximum particle diameter of 250 .mu.m, and a melting point and a sintering temperature higher than +800.degree. C., the melting point of the second mold being higher than 800.degree. C. and the second mold being ductile under the conditions of a hot isostatic pressing; (d) sealing the second mold in a gastight manner; and (e) subjecting the wetted cold compact to hot isostatic pressing at a minimum temperature of +800.degree. C. and a minimum pressure of 20 MPa.

Process for making an indium-tin-oxide shaped body

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Hammersbach, Germany

Bernd Stenger