Unaxis Balzers Limited

Bernd Heinz

Siegfried Krassnitzer

Walter Haag

Stanislav Kadlec

Martin Dubs

Pius Grunenfelder

Thomas Eisenhammer

A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.

Method for manufacturing a workpiece using a magnetron sputter source

To optimize the yield of sputtered-off material as well as the service life of the target on a magnetron source, in which simultaneously good attainable distribution values of the layer on the substrate, stable over the entire target service life, a concave sputter face in a configuration with small target-substrate distance d is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is disposed stationarily and an eccentrically disposed inner pole with a second outer pole part is developed rotatable about the central source axis

Magnetron sputter source

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Sevelen, Switzerland

Bernd Heinz