Ciba-geigy Corporation

Bernard Peter Stark

George E Green

John S Waterhouse

Edward Irving

Heinz Abel

Ewald Losert

Michael R Thoseby

Bryan Dobinson

Melvin Harris

Kenneth Winterbottom

John G Paul

A layer of a liquid composition containing a compound (A) having in the same molecule at least one (meth)acryloyl group and at least one bicyclo[2.2.1]hept-2-ene-6-yl unit is exposed to actinic radiation so that the layer solidifies due to photopolymerisation of (A) through the (meth)acryloyl group(s), remaining, however, photocrosslinkable. When desired, the solidified layer is exposed, as through a negative, to a substantially greater amount of actinic radiation, the parts so further exposed becoming more highly photocrosslinked through the bicyclo[2.2.1]hept-2-ene-6-yl unit(s) and hence insoluble. An image is produced which can be developed by means of suitable solvents. Examples of (A) include 3-(methacryloyloxy)-2-hydroxypropyl bicyclo[2.2.1]hept-2-ene-6-carboxylate and 2-(acryloyloxy)ethyl methyl-5-carboxybicyclo[2.2.1]hept-2-ene-6-carboxylate.

Photopolymerisation process with two exposures of a single layer

New aromatic sulfonylsulfoxonium salts are of formula ##STR1## where q is 1 to 4,

Sulfoxonium salts and their use as polymerization catalysts

Diepoxides which may be photopolymerized in the presence or absence of a photosensitizer contain a group having conjugated unsaturation attached to a nitrogen heterocycle, such as a hydantoin or barbituric acid residue, forming part of an advanced diepoxide. The resultant photopolymer may be crosslinked by heating in the presence of a curing agent for epoxide resins. The diepoxides are of use in the production of printing plates and printed circuits, especially multilayer printed circuits.

Photopolymerizable diepoxides containing a nitrogen heterocycle

The modified advanced epoxide resins described, having an average molecular weight of up to 50,000, can be photopolymerized without the need to include photosensitizers. They may be prepared by reaction of a diepoxide ##STR1## with a keto group-containing dihydric phenol ##STR2## to form the advanced epoxide resin ##STR3## followed by condensation with an aldehyde RCHO to yield ##STR4## In the above formulae, R is an organic group which preferably has ethylenic unsaturation or heterocyclic aromaticity in conjugation with the indicated ethylenic double bond; R.sup.1 is the divalent residue linking two epoxide groups; R.sup.2 is preferably a hydrogen atom but may be an organic group, halogen, or cyano; R.sup.3 is a trivalent aromatic or heterocyclic group, especially a group ##STR5## If desired, other dihydric phenols can be employed with that containing a keto group, and condensation with the aldehyde may be carried out so that only some groups --COCH.sub.2 R.sup.2 undergo reaction.

Photopolymerizable ketones

Thermosettable resin compositions which, when cured, are electrically conducting, comprise an adduct of an aliphatic diglycidyl ether with a haloanilic acid and, as curing agent, an aromatic amine containing at least three hydrogen atoms directly attached to nitrogen atoms which are themselves directly attached to aromatic nuclei.

Electrically-conductive resins, and intermediates for their preparation

Contamination of anaerobically-curing adhesive compositions by minute traces of metals such as iron, either during manufacture or storage, can result in premature polymerization, the shelf life of the composition being severely shortened, or, at best, unpredictable. In the anaerobic adhesive composition now disclosed, at least part of the polymerizable monomer comprises a novel acrylate ester containing a structure of the formula ##EQU1## these esters being capable of chelating the metal contamination.

Anaerobically-curing adhesives

A process for finishing keratinous material, especially rendering it shrink-resistant or imparting to it durably pressed effects, comprises

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Stapleford, United Kingdom

Bernard Peter Stark