General Electric Company

Martin Marietta Corporation

Bernard Gorowitz

Richard J Saia

Robert J Wojnarowski

Dale M Brown

Kevin Matthew Durocher

John H Lupinski

Manjin J Kim

Herbert S Cole

Stanton Earl Weaver, Jr

James Wilson Rose

Thomas Bert Gorczyca

Renato Guida

Charles Adrian Becker

Ronald Frank Kolc

Barry Scott Whitmore

Simon S Cohen

Wolfgang Daum

Bantval J Baliga

Paul Alan McConnelee

Raymond Albert Fillion

Charles S Korman

Constantine A Neugebauer

Ernest Wayne Balch

Eric J Wildi

Edith M Boldebuck

Ronald H Wilson

Theresa Ann Sitnik-Nieters

Tat-Sing P Chow

Michael Gdula

Stefan J Rzad

Michael W DeVre

Patricia A Piacente

Krishna Shenai

Ernest W Litch

Anthony A Immorlica, Jr

William H King

Richard Joseph Saia

An interface includes a surface having an electrically conductive pad; a compliant coating over the surface having a via extending to the pad; metallization patterned over the compliant coating and extending into the via; a low modulus dielectric interface layer overlying the compliant coating and having an interface via extending to the metallization; and a floating pad structure including floating pad metallization patterned over the dielectric interface layer with a first portion forming a central pad and a second portion forming an extension from the central pad extending into the interface via. Another interface includes a substrate including a low modulus dielectric interface material having a hole extending at least partially therethrough and a floating contact structure including electrically conductive material coating the hole with at least some of the floating pad metallization forming an extension from the hole. A conductive contact area interface may include an electrically conductive first contact area; an electrically conductive second contact area facing and being substantially aligned with the first contact area; and at least one interface structure coupled between the first and second contact areas and including an electrical conductor having a partially open interior to form a compliant joint between the first and second contact areas.

Methods of forming compliant interface structures with partially open interiors for coupling two electrically conductive contact areas

Interface structures for electronic devices

A capacitor is fabricated on a base surface by applying a first pattern of electrical conductors (a first capacitor plate) over the base surface with an outer surface of the first pattern of electrical conductors including molybdenum. A first hard portion of a capacitor dielectric layer including amorphous hydrogenated carbon is deposited over the first capacitor plate and the base surface, a soft portion of the capacitor dielectric layer is deposited over the first hard portion, and a second hard portion of the capacitor dielectric layer is deposited over the soft portion. The deposition of the soft portion occurs at a lower bias voltage than the deposition of the first and second hard portions. A second pattern of electrical conductors (a second capacitor plate) is applied over the capacitor dielectric layer which is then patterned. A polymer layer is applied over the first and second capacitor plates, and two vias are formed, a first via extending to the first capacitor plate and a second via extending to the second capacitor plate. An electrode-coupling pattern of electrical conductors is applied over the polymer layer, a first portion extending into the first via and a second portion extending into the second via. Deposition of the capacitor dielectric layer can include using a methylethylketone precursor. Additional capacitor dielectric layers and plates having staggered via landing pads can be layered to increase the capacitance.

Structure for thin film capacitors

Connection elements which, for example, may be used to facilitate interconnection to and stacking of electronic assemblies or may include an elongated conductive core, such as a wire or a hollow tube structure, coated with a layer of elastomeric material containing conductive particle such that the elastomeric material is conductive at least when compressed. The substrates of multi-chip modules (MCMs) have electrical connection sites in the form of metal-lined channels in the substrate edges, and the connection elements are pressed into the channels. Separate compression or clamping elements may be employed to enhance conductivity, as well as to facilitate external connections. The elongated conductive core may take the form of a hollow tube structure which may be expanded under internal pressure to compress the layer of elastomeric material. The compression elements may take the form of printed circuit boards. In alternative embodiments the connection elements may be clamped between conductive channels of side-by-side substrates or between opposed conductive channels of stacked substrates.

Demountable and repairable low pitch interconnect for stacked multichip

A protective cap is deposited over the top and sides of an air bridge structure located on an integrated circuit chip. The protective cap provides mechanical strength during the application of a high density interconnect structure over the chips, to prevent deformation of the sensitive (air bridge) structure, and also to prevent any contamination from intruding under the air bridge. More importantly, the protective cap does not impede the performance of the air bridge and therefore does not need to be removed, thereby eliminating the necessity of ablating the HDI structure. Furthermore, the protective cap allows additional area for metallization to provide alternate circuits for coupling, power or ground planes, etc.

Structure for protecting air bridges on semiconductor chips from damage

Fabrication method for thin film capacitors

A method for fabricating a stack of circuit modules includes providing a plurality of substrates having module interconnection layers. Each of the substrates has a circuit chip with chip pads positioned therein and an electrically conductive feed-through line extending from a first surface of the substrate to a second surface of the substrate with the first surface being perpendicular to the second surface. Each of the module interconnection layers is situated over a respective first surface of each of the substrates and includes a module dielectric layer having module vias therein and a module pattern of electrical conductors extending through the module vias to couple the selected chip pads to the feed-through line. The plurality of substrates are stacked. A side interconnection layer is applied over a side surface including the second surfaces of the substrates. The side interconnection layer includes a side dielectric layer having side vias therein aligned with predetermined ones of the feed-through lines and a side pattern of electrical conductors extending through the side vias.

Stacking of three dimensional high density interconnect modules with

Method for fabricating a stack of two dimensional circuit modules

A flexible, multilayer thin film capacitor comprises a flexible substrate and at least two electrode layers mounted on the substrate alternately with at least one dielectric layer. The dielectric layer may include amorphous hydrogenated carbon. The at least two electrode layers and the at least one dielectric layer are capable of acting as at least one capacitor, and the flexible substrate is capable of being manipulated so as to have a desired shape.

Flexible multilayer thin film capacitors

A method for fabricating a circuit module includes applying an outer insulative layer over a first patterned metallization layer on a first surface of a base insulative layer. A second surface of the base insulative layer has a second patterned metallization layer. At least one circuit chip having chip pads is attached to the second surface of the base insulative layer. Respective vias are formed to expose selected portions of the first patterned metallization layer, the second patterned metallization layer, and the chip pads. A patterned outer metallization layer is applied over the outer insulative layer to extend through selected ones of the vias to interconnect selected ones of the chip pads and selected portions of the first and second metallization layers.

Fabrication and structures of circuit modules with flexible interconnect

In a method for preserving an air bridge structure on an integrated circuit chip, a protective layer is plasma-deposited over the top and sides of the air bridge. A high density interconnect structure is applied over the chip and protective layer. The protective film provides mechanical strength during the application of the high density interconnect structure to prevent deformation. It also prevents any contamination from intruding under the air bridge. More importantly, the protective film only negligibly impedes the performance of the air bridge and therefore does not need to be removed, thereby eliminating the necessity of ablating the HDI structure.

Method for protecting gallium arsenide mmic air bridge structures

In a method for preserving an air bridge structure on an integrated circuit chip used in an overlay process, a patternable protective layer is applied for providing mechanical strength to prevent deformation during subsequent processing. A polymeric film layer is applied over the chip and protective layer, and interconnections are fabricated through the polymeric film layer. The polymeric film layer is removed from the area over the air bridge structure. The patternable protective layer is then removed, leaving the resultant structure with an undamaged air bridge which is free of residue.

Process for high density interconnection of substrates and integrated

Semiconductor device contact pads are enhanced by forming a metal plate over at least a portion of the contact pad. 'Enhancement' includes repair such as by bridging a reinforcing pad area over probe damage, general reinforcement or enlargement of a contact pad, and placement of a protective buffer pad over a contact pad. These methods are applicable to any semiconductor device with contact pads on a surface thereof, such as entire wafers, individual dice, and multi-chip High Density Interconnect (HDI) modules. The pad enhancement plate is formed by applying a planarizing dielectric layer over the entire device (if not already formed in the initial stages of HDI processing), and an enhancement access via is then formed to expose a portion of the contact pad to be enhanced. The entire device is metallized, and metal not over the exposed portion of the contact pad is subsequently removed. Localized heating of the metal plate can be achieved by a laser to effectuate a selective pseudo-weld or produce sintering for a low resistance ohmic contact.

Method for enhancement of semiconductor device contact pads

In fabricating wafer scale integrated interconnects, a temporary or permanent dielectric layer and a pattern of electrical conductors are used to provide wafer scale integration or testing and burn-in. A resist can be used to cover the areas of IC pads on the wafer while the remainder of the pattern of electrical conductors is removed to provide for repair of the wafer scale integration structure. The pattern of electrical conductors may be configured so that the conductor lengths between at least some sub-circuits on a plurality of wafers are substantially electrically equal for signal propagation purposes; an additional wafer may be laminated to the wafer using an adhesive; controlled curfs may be cut into the wafer; and the wafer may be interconnected to an interface ring.

Wafer level integration and testing

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Clifton Park, NY, United States of America

Bernard Gorowitz