Asml Netherlands B.v.

Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Bernard Gellrich

Erik Roelof Loopstra

Christiaan Alexander Hoogendam

Bob Streefkerk

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Jan Haisma

Andreas Wurmbrand

Paul Graupner

Nicodemus Hattu

Tjarko Adriaan Rudolf Van Empel

Bauke Jansen

Antonius Johannes Van Der Net

Rens Sanderse

The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.

Lithographic apparatus and device manufacturing method

Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

Growing community of inventors

Aalen, Germany

Bernard Gellrich