Rohm and Haas Electronic Materials Cmp Holdings, Inc.

Rodel Holdings, Inc.

Bernard Foster

T Todd Crkvenac

Clyde A Fawcett

Kenneth A Prygon

Paul J Freeman

A porous polishing pad is useful for polishing semiconductor substrates. The porous polishing pad has a porous matrix formed from a coagulated polyurethane and a non-fibrous polishing layer. The non-fibrous polishing layer has a polishing surface with a pore count of at least 500 pores per mmthat decreases with removal of the polishing layer; and the polishing surface has a surface roughness Ra between 0.01 and 3 &#x3bc;m.

Porous polyurethane polishing pads

A polishing pad installation tool comprised of a base portion and at least one compressible layer in operative connection with the base portion. The compressible layer includes a plurality of apertures through an upper surface of the compressible layer. The tool further includes a plurality of parallel pins extending outwardly from the base portion through the apertures of the compressible layer. Each of the pins includes a collar portion in surrounding relation about each pin. When the compressible layer is in an uncompressed condition, the collar portions are beneath the upper surface of the compressible layer. The pins are positioned on the base portion in a pattern which corresponds to the holes in the polishing platen. The pins have diameters which are smaller than the diameters of the holes in a polishing pad. The collars have diameters larger than the diameters of the holes in the polishing pad. As the pins of the tool enter the holes of the polishing pad, the compressible layer of the tool compresses against the polishing surface of the pad to adhesively bond the polishing pad to the polishing platen. The collar portions of the pins are operative to press against the edges of the holes of the polishing pad to seal the hole edges adjacent the polishing platen.

Polishing pad installation tool

A conditioning disk including a unitary thermoplastic polymer sheet material cut a unitary circular plate formed with gear teeth along its circular edge, and formed with block form protrusions that are impelled in a sweeping motion by rotation of the unitary plate as a planetary gear in meshed engagement with a sun gear and a ring gear of a polishing apparatus.

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Elkton, MD, United States of America

Bernard Foster