Samsung Electronics Co., Ltd.

Beomjin Yoo

Sang Ki Nam

Sungyong Lim

Vasily Pashkovskiy

Sunggil Kang

Kwangyoub Heo

Akira Koshiishi

Kyuhee Han

Hoseop Choi

Minhyoung Kim

Wonhyuk Jang

Jeongmin Bang

A hollow cathode includes an insulation plate having cathode holes. Bottom electrodes are below the insulation plate. The bottom electrodes define first holes having a width greater than a width of the cathode holes. Top electrodes are at an opposite side of the insulation plate from the bottom electrodes. The top electrodes define second holes aligned with the first holes along a direction orthogonal to the upper surface of the insulation plate.

Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathode

Disclosed are a method for cleaning a substrate, an apparatus for cleaning a substrate, and a method for fabricating a semiconductor device using the same. The method may include cleaning a substrate in a wet process, providing a supercritical fluid onto the substrate to remove moisture from the substrate, and cleaning the substrate in a dry process to remove defect particles from a substrate, which are produced by the supercritical fluid.

Substrate cleaning method, substrate cleaning apparatus, and method for fabricating a semiconductor device using the apparatus

Disclosed are a plasma processing apparatus and a method of manufacturing a semiconductor device using the same. The plasma processing apparatus comprises a chamber, an electrostatic chuck in the chamber and loading a substrate, a plasma electrode generating an upper plasma on the electrostatic chuck; and a hollow cathode between the plasma electrode and the electrostatic chuck, wherein the hollow cathode generates a lower plasma below the upper plasma. The hollow cathode comprises cathode holes each having a size less than a thickness of a plasma sheath of the upper plasma.

Plasma processing apparatus and method of manufacturing semiconductor device using the same

Growing community of inventors

Hwaseong-si, South Korea

Beomjin Yoo