Applied Materials, Inc.

Cypress Semiconductor Corporation

Benjamin Schwarz

Charles Hardy

James P Cruse

Adauto Diaz, Jr

Andrew Nguyen

Michael D Willwerth

Abhinav Kumar

Ming Xu

Zhuang Li

Eu Jin Lim

Kenneth S Collins

Jennifer Y Sun

Vijay D Parkhe

Thorsten B Lill

Li Zhang

Shahid Rauf

Tza-Jing Gung

Ren-Guan Duan

Ankur Agarwal

Jared Ahmad Lee

Chan-Lon Yang

Dermot Cantwell

Leonard Michael Tedeschi

Peter R Keswick

Evans Yip Lee

Zhiqiang Guo

Changhun Lee

Scott M Williams

Zhifeng Sui

Ping Han Hsieh

Daniel Thomas McCormick

Chih-Hsun Hsu

Jeffrey Ludwig

Xiaoliang Zhuang

Kiyoko Ikeuchi

Lien Lee

Guowen Ding

Olivier Joubert

Maxime Darnon

Ashley M Okada

Chung Liu

Hui Sun

Roberto Cesar Cotlear

Duc Dang Buckius

Jérémy Gilbert Maurice Pereira

Kevin Menguelti

Erwine Maude Pargon

Herrick Ng

Teh-Tien Sue

Aditi Mithun

Dai-Wen Tang

A gas distribution apparatus is provided having a first reservoir with a first upstream end and a first downstream end and a second reservoir with a second upstream end and a second downstream end. A reservoir switch valve is in fluid communication with the first downstream end of the first reservoir and the second downstream end of the second reservoir. The reservoir switch valve operable to selectively couple the first reservoir to an outlet of the reservoir switch valve when in a first state, and couple the second reservoir to the outlet of the reservoir switch valve when in a second state. A plurality of proportional flow control valves are provided having inlets coupled in parallel to the outlet of the reservoir switch valve The plurality of proportional flow control valves have outlets configured to provide gas to a processing chamber.

Fast gas exchange apparatus, system, and method

A method includes determining a plurality of features of a first original image of a first product that are expected to be different for one or more products to be produced via manufacturing parameters of a manufacturing process compared to the first product. The method further includes adjusting one or more of the plurality of features of the first original image to generate a first synthetic image. The method further includes providing a plurality of images including the first original image and the first synthetic image to train a machine learning model to generate a trained machine learning model configured to generate output associated with updating the manufacturing parameters of the manufacturing process.

Adaptive non-rigid targeted deformation of images for synthetic image generation

Implementations described herein provide a chamber lid assembly. In one embodiment, a chamber lid assembly includes a heater embedded in a dielectric body forming a boundary of a processing chamber, wherein the heater has one or more heating zones that are independently controlled.

Chamber lid with integrated heater

A method includes providing attributes of a manufacturing process and an image of a product associated with the manufacturing process to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, predictive data. The method further includes determining, based on the predictive data, image measurements of the image of the product associated with the manufacturing process. Manufacturing parameters of the manufacturing process are to be updated based on the image measurements.

Automated image measurement for process development and optimization

Embodiments may also include a residual chemical reaction diagnostic device. The residual chemical reaction diagnostic device may include a substrate and a residual chemical reaction sensor formed on the substrate. In an embodiment, the residual chemical reaction sensor provides electrical outputs in response to the presence of residual chemical reactions. In an embodiment, the substrate is a device substrate, and the sensor is formed in a scribe line of the device substrate. In an alternative embodiment, the substrate is a process development substrate. In some embodiments, the residual chemical reaction sensor includes, a first probe pad, wherein a plurality of first arms extend out from the first probe pad, and a second probe pad, wherein a plurality of second arms extend out from the second probe pad and are interdigitated with the first arms.

Wafer based corrosion and time dependent chemical effects

Methods, systems, and non-transitory computer readable medium are described for automated image measurement for process development and optimization. A method includes receiving an image of a product associated with a manufacturing process; determining, using a trained machine learning model, an image classification for the image; selecting, based on the image classification, one or more image processing algorithms for the image; pre-processing the image based on at least one of the one or more image processing algorithms to generate an enhanced image; measuring, using a first image processing algorithm of the one or more image processing algorithms, one or more attributes of the enhanced image to determine image measurements; and reporting the image measurements. The manufacturing parameters of the manufacturing process are to be updated based on the image measurements.

Methods, systems, and non-transitory computer readable medium are described for automated image measurement for process development and optimization. A method includes receiving original images including a first original image. Each original image is of a corresponding product associated with a manufacturing process. The method further includes performing, based on process information about the manufacturing process, feature extraction to identify features of the first original image that are expected to change based on manufacturing parameters of the manufacturing process. The method further includes generating a first synthetic image of synthetic images by performing targeted deformation of one or more of the features of the first original image. The method further includes using the original images and the synthetic images to train a machine learning model to automatically determine an image processing algorithm to use for measuring one or more attributes of images of product associated with the manufacturing process.

Electrostatic chucks with variable pixelated magnetic field are described. For example, an electrostatic chuck (ESC) includes a ceramic plate having a front surface and a back surface, the front surface for supporting a wafer or substrate. A base is coupled to the back surface of the ceramic plate. A plurality of electromagnets is disposed in the base, the plurality of electromagnets configured to provide pixelated magnetic field tuning capability for the ESC.

Electrostatic chuck with variable pixelated magnetic field

A machined ceramic article having an initial surface defect density and an initial surface roughness is provided. The machined ceramic article is heated to a temperature range between about 1000&#xb0; C. and about 1800&#xb0; C. at a ramping rate of about 0.1&#xb0; C. per minute to about 20&#xb0; C. per minute. The machined ceramic article is heat-treated in air atmosphere. The machined ceramic article is heat treated at one or more temperatures within the temperature range for a duration of up to about 24 hours. The machined ceramic article is then cooled at the ramping rate, wherein after the heat treatment the machined ceramic article has a reduced surface defect density and a reduced surface roughness.

Ceramic article with reduced surface defect density

Embodiments herein provide apparatus and methods for performing an etching process on a spacer layer with good profile control in multiple patterning processes. In one embodiment, a method for patterning a spacer layer during a multiple patterning process includes conformally forming a spacer layer on an outer surface of a patterned structure disposed on a substrate, wherein the patterned structure has having a first group of openings defined therebetween and etching the spacer layer disposed on the substrate while forming an oxidation layer on the spacer layer.

Methods for manufacturing a spacer with desired profile in an advanced patterning process

Ceramic article with reduced surface defect density and process for producing a ceramic article

Methods for removing halogen-containing residues from a substrate are provided. By combining the heat-up and plasma abatement steps, the manufacturing throughput can be improved. Further, by appropriately controlling the pressure in the abatement chamber, the removal efficiency can be improved as well.

Method for removing halogen-containing residues from substrate

Methods for reducing the contamination of a gas distribution plate are provided. In one embodiment, a method for processing a substrate includes transferring the substrate into a chamber, performing a treating process on the substrate, and providing a purge gas into the chamber before or after the treating process to pump out a residue gas relative to the treating process from the chamber. The treating process includes distributing a reactant gas into the chamber through a gas distribution plate.

Method extending the service interval of a gas distribution plate

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San Jose, CA, United States of America

Benjamin Schwarz