Applied Materials, Inc.

Benjamin Oswald

Craig Richard Chaney

Daniel R Tieger

Graham Wright

Daniel Alvarado

Shreyansh P Patel

William R Bogiages, Jr

Brian S Gori

An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

Temperature control for insertable target holder for solid dopant materials

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Gloucester, MA, United States of America

Benjamin Oswald