Mks Instruments, Inc.

Lam Research Corporation

Benjamin J Gitlin

Aaron Michael Burry

Aaron T Radomski

Larry J Fisk, Ii

Mariusz Oldziej

John Patrick Holland

Alexei Marakhtanov

Felix Leib Kozakevich

Ranadeep Bhowmick

Bing Ji

Jonathan W Smyka

Matthew G Harrington

A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.

High speed synchronization of plasma source/bias power delivery

An arc detector for a RF power supply system, where the RF power supply incudes a first RF power supply and a second RF power supply. A signal applied to a non-linear load varies in accordance with an output from one of the first RF power supply or the second RF power supply. The signal has a frequency. During an arc or arc condition in the non-linear load, the frequency of the signal changes, and if the frequency is outside of a selected range, an arc or arc condition is indicated. The frequency can be determined by digitizing the signal into a series of pulses and measuring a time or period between pulses.

System and method for arc detection using a bias RF generator signal

Growing community of inventors

Rochester, NY, United States of America

Benjamin J Gitlin