Toyota Motor Engineering & Manufacturing North America, Inc.

Toyota Motor Corporation

University of Washington

Washington University

Benjamin Alan Grayson

Masahiko Ishii

Minjuan Zhang

Debasish Banerjee

Charles Alexander Roberts

Torin C Peck

Yasuo Uehara

Krishna R Gunugunuri

Blake A Graham

Debasish Benerjee

Younan Xia

Paul Timothy Fanson

Masahiko Ishil

Charles Taylor Campbell

Yunqian Dai

Byungkwon Lim

A catalyst for direct decomposition removal of NOx from an exhaust gas stream to Nand O, the catalyst comprising a dual dispersed supported metal oxide material, which comprises MOx-CuOx dispersed on a COOspinel oxide support, wherein M is selected from the group consisting of Zn, Ce, Mg, Tb, and Gd. The dual dispersed supported metal oxide catalysts have good activity and selectivity for N.

Dual dispersed MOx-CuOx/CoOsupported metal oxide catalysts for direct NOx decomposition

An oxygen storage material (OSM) includes a zinc manganese iron oxide (ZMF) and an alkali metal base on the ZMF surface. The ZMF has a spinel structure. The alkali metal containing ZMF can be formed to have a weight percent of alkali metal up to about two percent. The alkali metal carbonate is retained on the ZMF surface upon heating to a temperature greater than 1,000&#xb0; C. and stabilizes the ZMF to the cycling of an oxygen rich and oxygen lean atmosphere. The OSM additionally catalyzes the oxidation of hydrocarbons and CO and catalyzes the reduction of NOfor use in catalytic converters.

Zinc manganese-iron spinel with an alkali metal stabilizer as an oxygen storage material resistant to rich/lean aging

Catalyst for oxygen storage capacity applications that include a zinc doped manganese-iron spinel mixed oxide material. The zinc doped manganese-iron spinel mixed oxide material may be synthesized by a co-precipitation method using a precipitation agent such as sodium carbonate and exhibits a high oxygen storage capacity.

Zinc doped manganese-iron spinel catalyst material and method of making and using the same

In one embodiment, a semi-transparent reflector may include a multilayered photonic structure. The multilayered photonic structure includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric material. The plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material of the multilayered photonic structure are arranged in an [LH . . . (LH). . . L] structure. L is one of the plurality of coating layers of low index dielectric material. H is one of the plurality of coating layers of high index dielectric material. N is a positive integer. The multilayered photonic structure has substantially constant reflectance values for wavelengths of electromagnetic radiation in a visible spectrum over a range of angles of incidence of the electromagnetic radiation.

Semi-transparent reflectors

A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer&#x2267;1. The low index dielectric material may have an index of refraction nfrom about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nfrom about 1.8 to about 3.5, wherein n&#x3e;nand the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

Multi-layer photonic structures having omni-directional reflectivity and coatings incorporating the same

A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer &#x2267;1. The low index dielectric material may have an index of refraction nfrom about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nfrom about 1.8 to about 3.5, wherein n&#x3e;nand the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

An omnidirectional reflector that reflects a band of electromagnetic radiation of less than 100 nanometers when viewed from angles between 0 and 45 degrees is provided. The omnidirectional reflector includes a multilayer stack having a plurality of layers of high index of refraction material and a plurality of layers of low index of refraction material. In addition, the plurality of high index of refraction material layers and low index of refraction material layers are alternately stacked on top of or across each other and provide a non-periodic layered structure.

Omnidirectional reflector

A multilayer photonic structure may include a plurality of coating layers of high index dielectric material of index of refraction nand a plurality of coating layers of low index dielectric material of index of refraction nalternately arranged with a first coating layer and a last coating layer of the multi-layer photonic structure comprise low index material. An index-thickness of each coating layer of the multilayer photonic structure is different than every other coating layer of the multilayer photonic structure. The multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth.

Multilayer photonic structures

A catalyst material for use at elevated temperatures is provided. The material can include a plurality of fibers and a plurality of particles supported on the fibers. In addition, a porous layer can cover the plurality of particles and allow for process fluid to come into contact with the particles, and yet retard sintering of the particles at elevated temperatures is present. The plurality of fibers can be a plurality of nanofibers which may or may not be oxide nanofibers. The particles can be metallic nanoparticles and the porous layer can be a porous oxide layer.

Dual-oxide sinter resistant catalyst

A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.

Methods for producing omni-directional multi-layer photonic structures

In one embodiment, a method for identifying an article of manufacture may include: producing a plurality of multilayer photonic structures, wherein each of the plurality of multilayer photonic structures has a unique intensity profile; incorporating one of the plurality of multilayer photonic structures that produces the unique intensity profile into a coating; and generating an electronic code corresponding to the unique intensity profile of one of the plurality of multilayer photonic structures.

Methods for identifying articles of manufacture

In one embodiment, the optical lock system may include an electronic control unit, a lock housing including a lock chamber, and an optical key including a multilayer photonic structure. The multilayer photonic structure may produce a unique intensity profile and includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric. A light source may transmit a reference light to the multilayer photonic structure when the optical key is disposed within the lock chamber. A photo detector may receive an interaction light from the multilayer photonic structure and may transmit the unique intensity profile to the electronic control unit which may execute machine readable instructions to: compare the unique intensity profile to an electronic master; and cause the lock actuator to transition from a first state to a second state when the unique intensity profile corresponds to the electronic master.

Growing community of inventors

Ann Arbor, MI, United States of America

Benjamin Alan Grayson