Filplas Vacuum Technology Pte Ltd.

Nanyang Technological University

Centre National De La Recherche Scientifique

Thales Solutions Asia Pte Ltd

Other

Université Grenoble Alpes

Université De Lille

Université De Limoges

Université Des Sciences Et Technologies De Lille 1

L'institut Polytechnique De Grenoble

Filpas Vacuum Technology Pte Ltd.

Beng Kang Tay

Xu Shi

Hong Siang Tan

David Ian Flynn

Philippe Coquet

Dominique Baillargeat

Philippe Ferrari

Stéphane Bila

Emmanuel Pistono

Florence Podevin

Mathieu Cometto

Kamel Frigui

Dunlin Tan

Jong Jen Yu

David Hee

Michael Fulton

Jianxiong Wang

A nanostructure transfer method is provided. The method includes providing a first substrate () having thereon a plurality of nanostructures (), the nanostructures () extending away from the first substrate (). A solder material () is deposited on distal ends of the nanostructures (). A second substrate () having thereon a first metal layer () is provided. The solder material () is bonded to the first metal layer (), thereby attaching the nanostructures () to the second substrate (). The attached nanostructures () are then released from the first substrate ().

Nanostructure transfer method

An interposer () and a substrate () incorporating the interposer () are provided. The interposer () includes one or more layers () and a cavity () defined in the one or more layers (), the cavity () being configured as a waveguide for propagation of electromagnetic waves.

Interposer and substrate incorporating same

A method of fabricating an electrical guard structure for providing signal isolation is provided. The method includes providing a substrate having a mounting surface comprising a first area for hosting at least one electronic component. The method further comprises synthesizing a plurality of thread-like structures over the substrate to collectively form one or more electrically conductive projections extending transverse to the mounting surface. The one or more electrically conductive projections include one or more wall-like structures which are elongate parallel to the mounting surface. The electrically conductive projections can be transferred to another surface such as a major surface of a second substrate. There are further provided a support structure and a guard structure having the wall-like electrically conductive projections which are electrically grounded when in use to provide signal isolation.

Guard structure for signal isolation

A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter () for further removal of macroparticles from the plasma, made up of a baffle (), an aperture () through which plasma can pass and second magnetic means () for steering plasma through the aperture. The aperture size may be less than 33% of the duct sectional area at that point. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.

Enhanced macroparticle filter and cathode arc source

The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminum. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, while retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements. A composite coating comprises tetrahedral amorphous carbon and a metallic element other than carbon, the composite coating having an spcontent of at least 60%. A target for use in a cathode arc source comprises a mixture of carbon and a metallic element other than carbon.

Composite coatings

A cathode arc source has means for generating first and second magnetic fields, of opposite or reverse direction to each other. The resultant magnetic field includes a null point between the target and the substrate, though close to the target. Field strength normal to the target is zero at the null point, and field strength lateral to the target is strong at the target surface, constraining movement of the arc spot and reducing the risk of migration off the target surface. A target is made by pressing graphite powder at elevated temperature and pressure in the absence of binding material. Both source and target contribute to reduced macroparticles in deposited films.

Cathode arc source with magnetic field generating means positioned above and below the cathode

Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.

Filtered cathode arc source deposition apparatus

A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter for further removal of macroparticles from the plasma, made up of a baffle, an aperture through which plasma can pass and second magnetic means for steering plasma through the aperture. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.

A cathode arc source generates positive ions from a non-graphite target. The cathode arc source includes (a) a cathode station to receive the target; (b) a first magnet to generate a first magnetic field at the target; and (c) a second magnet to generate a second magnetic field at the target. The second magnetic field has a direction opposite to that of the first magnetic field so that the resultant magnetic field has a point of zero field strength above the target. In an embodiment, the first magnet is located below the target and includes a coil with a diameter greater than the diameter of the target. The second magnet is located above the target.

Cathode arc source for metallic and dielectric coatings

The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements. A composite coating comprises tetrahedral amorphous carbon and a metallic element other than carbon, the composite coating having an sp content of at least 60%. A target for use in a cathode arc source comprises a mixture of carbon and a metallic element other than carbon.

A coating of positive ions is applied to a substrate by generating an arc at a cathode, directing a beam of ions emitted from the cathode to the substrate via a filter path to remove macroparticles, igniting the arc by moving an arc ignition from a retracted position to an ignition position in which cathode contact is made, and storing the position in which arc ignition occurred.

Ignition means for a cathodic arc source

Apparatus for feeding a target into a chamber of a cathode arc source comprises support structure (,) attached to or integral with the cathode arc source (,), a cathode station (,) for receiving a target (,) in electrical connection with an arc power supply, wherein the cathode station is mounted for movement (,) on the support structure relative to the chamber so as to feed the target into the chamber. The apparatus can also have a target cutter in the chamber for removing an upper portion of the target. A graphite target for feeding into the source is a composite of at least inner and outer sections, the inner section comprising graphite powder and having a density in the range 1.7-2.0 g/cm,and the outer section comprising graphite powder and having a density that is at least 0.1 g/cm,less than that of the inner section.

Cathode arc source with target feeding apparatus

The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements. A composite coating comprises tetrahedral amorphous carbon and a metallic element other than carbon, the composite coating having an sp.sup.3 content of at least 60%. A target for use in a cathode arc source comprises a mixture of carbon and a metallic element other than carbon.

Growing community of inventors

Singapore, Singapore

Beng Kang Tay