Eastman-kodak Company

Benedikt Uhl

Oliver Richard Blum

Oliver Merka

Jan-Phillip Kemmling

Philipp Viehmann

Lithographic printing plate precursors are prepared with a unique substrate and one or more radiation-sensitive imageable layers. The substrate is prepared by two separate anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (T) of 650-3,000 nm and a multiplicity of inner micropores having an average inner micropore diameter (D) of &#x2264;15 nm. A formed outer aluminum oxide layer comprises a multiplicity of outer micropores having an average outer micropore diameter (D) of 15-30 nm; an average dry thickness (T) of 130-650 nm; and a micropore density (C) of 500-3,000 micropores/&#x3bc;m. The ratio of Dto Dis greater than 1.1:1, and Din nanometers and the outer aluminum oxide layer micropore density (C) in micropores/&#x3bc;m, are further defined by the outer aluminum oxide layer porosity (P) according to the following equation:0.3&#x2264;&#x2264;0.8where Pis 3.14(C)(D)/4,000,000.

Lithographic printing plate precursors and method of use

On-press developable, negative-working lithographic printing plate precursors are used to provide lithographic printing plates. Such precursors are prepared with a substrate and one or more negative-working, infrared radiation-sensitive imagable layers. The substrate is prepared by two separate anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (T) of 650-3,000 nm and inner micropores having an average inner micropore diameter (D) of &#x3c;15 nm. A formed outer aluminum oxide layer comprises outer micropores having an average outer micropore diameter (D) of 15-30 nm; an average dry thickness (T) of 130-650 nm; and a micropore density (C) of 500-3,000 micropores/&#x3bc;m. The ratio of Dto Dis greater than 1.1:1, and Din nanometers and the outer aluminum oxide layer micropore density (C) in micropores/&#x3bc;m, are further defined by the outer aluminum oxide layer porosity (P) as:0.3&#x2264;&#x2264;0.8wherein Pis 3.14(C)(D)/4,000,000.

Growing community of inventors

Ulm, Germany

Benedikt Uhl