Carl Zeiss Meditec Ag

Carl Zeiss Microscopy Gmbh

Carl Zeiss Ag

Carl Zeiss Sms Ltd.

Beate Boehme

Toralf Gruner

Michael Totzeck

Hans-Juergen Dobschal

Tiemo Anhut

Daniel Schwedt

Daniel Kraehmer

Mario Gerlach

Matthias Wald

Bernd Geh

Vladimir Kamenov

Olaf Dittmann

Ulrich Stroessner

Joern Greif-Wuestenbecker

An eye lens includes an optical part, which defines a first optical surface. The first optical surface is configured as turn with a pitch extending circumferentially about a principal axis (A) of the eye lens. A transition region is formed between a beginning and an end of the turn, which with a beginning edge and an end edge merges into the turn. The beginning edge extends between the principal axis (A) and a first circumferential location and the end edge extends between the principal axis (A) and a second circumferential location. The beginning edge projected into a plane (H) perpendicular to the principal axis (A) has a non-linear course and/or the end edge projected into a plane (H) perpendicular to the principal axis (A) has a non-linear course.

Eye lens with a specifically shaped transition region of an optical part

A laser scanning microscope for the acquisition of object images according to varied observation criteria. The microscope includes an illumination and detection unit, an illumination and a detection beam, a microscope objective, a scanning device with a scanning optical component and several scanners, with switching mirrors, each mirror with two switching positions, provided in the illumination and detection beams. Each switching position is assigned to one of several different, optically separate beam paths and each beam path defines a separate operating mode. A concave mirror for imaging a first scanner into at least one more scanner and vice versa is arranged in at least one of the beam paths.

Laser scanning microscope

A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.

Method for determining intensity distribution in the image plane of a projection exposure arrangement

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Grosspuerschuetz, Germany

Beate Boehme