Asml Netherlands B.v.

Carl-zeiss-smt Ag

Bauke Jansen

Hans Jansen

Kornelis Tijmen Hoekerd

Anthonius Martinus Cornelis Petrus De Jong

Richard Joseph Bruls

Raymond Gerardus Marius Beeren

Marco Koert Stavenga

Roelof Frederik De Graaf

Ivo Adam Johannes Thomas

Marcio Alexandre Cano Miranda

Gheorghe Tanasa

Siebe Landheer

Jeroen Peter Johannes Bruijstens

Peter Franciscus Wanten

Arnout Johannes Meester

Johannes Wilhelmus Jacobus Leonardus Cuijpers

Hubertus Leonardus Franciscus Heusschen

Laurentius Catrinus Jorritsma

Maurice Martinus Johannes Van Der Lee

Lambertus Dominicus Noordam

Erik Roelof Loopstra

Bernhard Gellrich

Tjarko Adriaan Rudolf Van Empel

Yuri Johannes Gabriël Van De Vijver

Antonius Johannes Van Der Net

Rens Sanderse

Christiaan Alexander Hoogendam

Bob Streefkerk

Johannes Jacobus Matheus Baselmans

Antonius Johannus Van Der Net

Andreas Wurmbrand

Paul Graeupner

Juergen Fischer

Anthonie Kuijper

Pieter Jacob Kramer

Arjan Hubrecht Josef Anna Martens

Bernard Gellrich

Eric Willem Felix Casimiri

Raymond Gerardus Marlus Beeren

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

Lithographic apparatus and in-line cleaning apparatus

Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure

An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.

Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.

Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure

A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.

An immersion type lithographic apparatus includes an immersion system configured to at least partially fill an immersion space with an immersion liquid. The apparatus also includes an indicator configured to indicate whether a part of the immersion system should be cleaned and a cleaning liquid supply system configured to supply a cleaner to the part of the lithographic apparatus. The cleaner is at least one of a plurality of different cleaners. Each cleaner or combination of cleaners is configured to clean a different type and/or level of contamination in the part of the lithographic apparatus. The apparatus also includes a controller configured to control which of the plurality of cleaners is provided to the part of the lithographic apparatus, based on an indication received from the indicator.

A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.

Lithographic appararus and method

A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.

Cleaning device and a lithographic apparatus cleaning method

A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.

Growing community of inventors

Deurne, Netherlands

Bauke Jansen