Asml Netherlands B.v.

Bastiaan Andreas Wilhelmus Hubertus Knarren

Thibault Simon Mathieu Laurent

Robbert Jan Voogd

Johan Gertrudis Cornelis Kunnen

Johannes Henricus Wilhelmus Jacobs

Nicolaas Ten Kate

Joost Jeroen Ottens

Marinus Jan Remie

Giovanni Francisco Nino

Raymond Wilhelmus Louis Lafarre

Koen Steffens

Ruud Hendrikus Martinus Johannes Bloks

Takeshi Kaneko

Gerardus Adrianus Antonius Maria Kusters

Gregory Martin Mason Corcoran

Ramin Badie

Allard Eelco Kooiker

Haico Victor Kok

Jan Steven Christiaan Westerlaken

Yuri Johannes Gabriël Van De Vijver

Johannes Hubertus Antonius Van De Rijdt

Johannes Antonius Maria Van De Wal

Wilhelmina Margareta Jozef Hurkens-Mertens

Yohann Bruno Yvon Teillet

Raymond Turk

Arjan Gijsbertsen

Andrey Valerievich Rogachevskiy

Doru Cristian Torumba

Raymund Centeno

Tabitha Wangari Kinyanjui

Robbert-Jan Voogd

Nico Antonius Hubertus Johannes Boonen

Jan Arie Den Boer

Cristina Caresio

The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.

Height measurement method and height measurement system

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

Lithographic apparatus and method

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

Sensor, lithographic apparatus and device manufacturing method

A detector module () is described that includes at least one detector () for sensing photon radiation, an electronic circuit () coupled to the at least one detector (), and a housing () having a first and a second body (), each having a bottom part () and an at least partially cylindrical part () extending from the bottom part (), wherein the at least partially cylindrical part () of the first body () is thermally coupled with the at least partially cylindrical part () of the second body (), wherein the at least partially cylindrical part () of the first body () extends towards the bottom part () of the second body (), and wherein the electronic circuit () is arranged inside the housing (). A lithographic apparatus including the detector module () is also described.

Detector module, cooling arrangement and lithographic apparatus comprising a detector module

A cooling arrangement is described and includes a heat sink having a first thermal contact surface, an object having a second thermal contact surface and a resilient wall. The first thermal contact surface and the second thermal contact surface face each other and define a gap. The resilient wall is part of an enclosure that surrounds a space at least comprising the gap, and the cooling arrangement includes a facility to maintain a pressure difference between the space and an environment of the cooling arrangement. Additionally, a lithographic apparatus comprising such a cooling arrangement is described.

Cooling arrangement and lithographic apparatus comprising a resilient wall creating a gap between a detector module housing and a heat sink of the cooling arrangement

Growing community of inventors

Nederweert-Eind, Netherlands

Bastiaan Andreas Wilhelmus Hubertus Knarren