The United States of America As Represented by the United States

Basil F Gavin

Robert A MacGill

Raymond K Thatcher

An improved liquid-film electron stripper particularly for high intensity heavy ion beams which produces constant regenerated, stable, free-standing liquid films having an adjustable thickness between 0.3 to 0.05 microns. The improved electron stripper is basically composed of at least one high speed, rotating disc with a very sharp, precision-like, ground edge on one said of the disc's periphery and with a highly polished, flat, radial surface adjacent the sharp edge. A fine stream of liquid, such as oil, impinges at a 90.degree. angle adjacent the disc's sharp outer edge. Film terminators, located at a selected distance from the disc perimeter are positioned approximately perpendicular to the film. The terminators support, shape, and stretch the film and are arranged to assist in the prevention of liquid droplet formation by directing the collected film to a reservoir below without breaking or interfering with the film. One embodiment utilizes two rotating discs and associated terminators, with the discs rotating so as to form films in opposite directions, and with the second disc being located down beam-line relative to the first disc.

Liquid-film electron stripper

An ion source of the Penning discharge type having a self-cleaning aperture is provided by a second dynode (24) with an exit aperture (12) in a position opposite a first dynode 10a, from which the ions are sputtered, two opposing cathodes (14, 16), each with an anode (18, 20) for accelerating electrons emitted from the cathodes into a cylindrical space defined by the first and second dynode. A support gas maintained in this space is ionized by the electrons. While the cathodes are supplied with a negative pulse to emit electrons, the first dynode is supplied with a negative pulse (e.g., -300 V) to attract atoms of the ionized gas (plasma). At the same time, the second dynode may also be supplied with a small voltage that is negative with respect to the plasma (e.g., -5 V) for tuning the position of the plasma miniscus for optimum extraction geometry. When the negative pulse to the first dynode is terminated, the second dynode is driven strongly negative (e.g., -600 V) thereby allowing heavy sputtering to take place for a short period to remove virtually all of the atoms deposited on the second dynode from material sputtered off the first dynode. An extractor (22) immediately outside the exit aperture of the second dynode is maintained at ground potential during this entire period of sputtering while the anode, dynode and cathode reference voltage is driven strongly positive (about +20 kV to +30 kV) so that ions accelerated through the aperture will be at ground potential. In that manner, material from the first dynode deposited on the second dynode will be sputtered, in time, to add to the ion beam. Atoms sputtered from the second dynode which do not become ionized and exit through the slit will be redeposited on the first dynode, and hence recycled for further ion beam generation during subsequent operating cycles.

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Berkeley, CA, United States of America

Basil F Gavin