Planar Semiconductor, Inc.

Lam Research Corporation

Basha Sajjad

Shmuel Erez

Rubinder S Randhawa

Harry Christov

Adrien Lavoie

Shankar Swaminathan

Ramesh Chandrasekharan

Hu Kang

Seshasayee Varadarajan

Frank Loren Pasquale

Edward J Augustyniak

Chloe Baldasseroni

Yukinori Sakiyama

Jennifer Leigh Petraglia

Saangrut Sangplung

A showerhead in a semiconductor processing apparatus can include faceplate through-holes configured to improve the flow uniformity during atomic layer deposition. The showerhead can include a faceplate having a plurality of through-holes for distributing gas onto a substrate, where the faceplate includes small diameter through-holes. For example, the diameter of each of the through-holes can be less than about 0.04 inches. In addition or in the alternative, the showerhead can include edge through-holes positioned circumferentially along a ring having a diameter greater than a diameter of the substrate being processed. The showerhead can be a low volume showerhead and can include a baffle proximate one or more gas inlets in communication with a plenum volume of the showerhead. The faceplate with small diameter through-holes and/or edge through-holes can improve overall film non-uniformity, improve azimuthal film non-uniformity at the edge of the substrate, and enable operation at higher RF powers.

Low volume showerhead with faceplate holes for improved flow uniformity

Cleaning and drying of semiconductor wafers is carried out in a single-chamber type cleaning/drying apparatus for flat objects such as semiconductor wafer, where cleaning is carried out by impinging both sides of the wafer which rotates at a relatively low speed with jets of a washing liquid and where subsequent drying is carried out in the same chamber by increasing the rotation speed of the wafer and supplying an isopropyl-alcohol (IPA) mist onto the wafer from the top of the chamber. After the IPA forms a solution with the residue of water on the wafer, the drying process is accelerated by supplying gaseous nitrogen through nozzles arranged on both side of the coaxial with the wafer center. As a result, the IPA-water solution quickly evaporates without leaving traces of water drops on the dried surface.

Method for precision cleaning and drying flat objects

A single-chamber type cleaning-drying apparatus for flat objects, such as semiconductor wafers, wherein cleaning is carried out by impinging both sides of the wafer, which rotates at a relatively low speed, with jets of a washing liquid and wherein subsequent drying is carried out in the same chamber by increasing the rotation speed of the wafer and supplying isopropyl-alcohol (IPA) mist onto the wafer from the top of the chamber. After the IPA forms a solution with the residue of water on the wafer, the drying process is accelerated by supplying gaseous nitrogen through nozzles arranged on both sides of the wafer he coaxially with the wafer center. As a result, the IPA-water solution quickly evaporates without leaving traces of water drops on the dried surface.

Single-chamber apparatus for precision cleaning and drying of flat objects

A substrate holding and rotary driving mechanism, e.g., for a cleaning chamber with vertical orientation of the wafer, that is comprised of a three-armed spider which is rotatingly installed on the outer side of the cleaning chamber and rotatingly supports on the outer ends of its arms outer shafts with eccentrically arranged inner shafts. The inner shafts pass through the outer shafts into the cleaning chamber where they support contact rollers, while the opposite ends of the inner shafts support gears driven into rotation by a synchronous belt. The contact rollers can be moved apart for insertion or removal of wafers from and into the chamber. This is achieved by turning the spider with eccentric inner shafts in one or another direction.

Holding and rotary driving mechanism for flat objects

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Pleasanton, CA, United States of America

Basha Sajjad