Asml Netherlands B.v.

Bas Willems

Cornelius Maria Rops

Ronald Van Der Ham

Gerben Pieterse

Ruud Olieslagers

Hubert Marie Segers

Jozef Augustinus Maria Alberti

Aart Adrianus Van Beuzekom

Francis Fahrni

Pepijn Van Den Eijnden

Paul Van Dongen

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

Lithographic apparatus, method of transferring a substrate and device manufacturing method

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Nijmegen, Netherlands

Bas Willems