Asml Netherlands B.v.

Bas Johannes Petrus Roset

Siegfried Alexander Tromp

Raymond Wilhelmus Louis Lafarre

Johannes Petrus Martinus Bernardus Vermeulen

Satish Achanta

Ilya Malakhovsky

Tiannan Guan

Benjamin Cunnegonda Henricus Smeets

Johannes Hendrik Everhardus Aldegonda Muijderman

The invention provides an inspection apparatus for inspecting an object, the apparatus comprising: a measurement system configured to measure: —a first parameter of the object across an area of interest of the object, and —a second parameter, different from the first parameter, of the object at a plurality of locations on the object; a stage apparatus configured to position the object relative to the measurement system during a measurement of the first parameter, wherein the measurement system is configured to measure the second parameter at the plurality of different locations during the measurement of the first parameter and wherein the stage apparatus is configured to position the object relative to the measurement system based on a compliance characteristic of the stage apparatus.

Inspection apparatus lithographic apparatus measurement method

A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body () having a main body surface; and a plurality of burls () projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; and a flow control feature () configured to form a gas cushion adjacent the periphery of the substrate holder when a substrate is being lowered onto the substrate holder.

Substrate holder, a lithographic apparatus and method of manufacturing devices

A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.

Substrate table and lithographic apparatus

Growing community of inventors

Eindhoven, Netherlands

Bas Johannes Petrus Roset