Asml Netherlands B.v.

Bartholomeus Catharina Thomas Van Bree

Johannes Petrus Martinus Bernardus Vermeulen

Antonius Franciscus Johannes De Groot

Robert-Han Munnig Schmidt

Christiaan Louis Valentin

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.

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Meijel, Netherlands

Bartholomeus Catharina Thomas Van Bree