Lexmark International, Inc.

Funai Electric Company Ltd.

Bart Mansdorf

Xiaoming Wu

Sean Terrance Weaver

Kelly Ann Killeen

David Christopher Graham

Donald Wayne Stafford

Paul Timothy Spivey

David L Bernard

Paul William Dryer

Craig Michael Bertelsen

David Starling MacMillan

Christopher Allen Craft

Rich Wells

Dell T Rosa

Mark Stephen Weisman, Jr

Mark William Johnson

Joel P Provence

Bryan Thomas Fannin

Karina Anne Krawczyk

A method of forming a patterned photoresist layer having a hydrophobic surface is provided. The method includes forming a photoresist layer on a substrate and image patterning. The photoresist layer may comprise a polymeric material. The imaged photoresist layer may then undergo a two-stage post-exposure bake. A surface treatment may be performed on the photoresist layer in between the two-stage post-exposure bake. The surface treatment may include applying a siloxane solution on a partially post-exposure baked photoresist layer. The post-exposure baked photoresist layer may then be developed to form the patterned photoresist layer. The method may be used to form a hydrophobic photoimageable nozzle plate of a micro-fluid ejection head having improved mechanical properties and stable hydrophobic properties.

Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate

Environmentally friendly thick film layers for a micro-fluid ejection head and micro-fluid ejection heads are disclosed. The environmentally friendly thick film layer includes a negative photoresist layer derived from a composition comprising a multi-functional epoxy compound, a low molecular weight polymeric difunctional epoxy compound, a monomeric difunctional epoxy compound, a methide-based photoacid generator that does not contain antimony, a chromophore and an aryl ketone solvent. Optionally the photoresist layer contains an adhesion enhancer. The negative photoresist layer is environmentally friendly and provides good resolution, well defined critical dimensions, straight side walls, and a large processing window.

Formulations for environmentally friendly photoresist film layers

There is disclosed a removable radiation cured member suitable for use in protecting a micro-fluid ejection head. Further, a reactant mixture suitable for sealing a micro-fluid ejection head comprising a vinyl-containing oligomer, a filler, and optionally a reactive diluent and/or a photoinitiator is disclosed.

Removable radiation cured composition and process for protecting a micro-fluid ejection head

The present disclosure relates to the use of radiation cured coatings that may be used in a device within an image forming apparatus. The coating composition may include a reactive oligomer capable of radiation curing having a number average molecular weight (Mn) of greater than 1500. A reactive diluent may then be combined with the reactive oligomer, which diluent is also capable of radiation curing and which has a Mn of less than or equal to 1500. The reactive diluent may be present at a level of less than fifty percent by weight of the coating composition. The coating composition may be present at a solids level of 90-100%.

Radiation cured coatings for image forming device components

A nozzle plate for a micro-fluid ejection head, a method of making a hydrophobic nozzle plate, and a method for improving the resiliency of a nozzle plate. The nozzle has a photoimageable hydrophobic polycyclic polyolefin layer derived from an epoxy functionalized polynorbornene.

Hydrophobic nozzle plate structures for micro-fluid ejection heads

Growing community of inventors

Lexington, KY, United States of America

Bart Mansdorf