Eaton Corporation

Science Research Laboratory, Inc.

Newton Scientific, Inc.

Other

Massachusetts Institute of Technology

Washington University

Barbara J Hughey

Ruth E Shefer

Robert E Klinkowstein

Julian G Blake

Peter H Rose

Adam A Brailove

Steven R Tannenbaum

John Timothy Mehl

Richard F McRay

Zhongmin Yang

John S Wishnok

Paul L Skipper

Kenneth Harry Purser

Jonah H Jacob

Allen M Flusberg

Michael John Welch

Naomi A Fried

Carmen S Dence

An interface for introducing a non-gaseous sample as a predetermined gaseous form into an accelerator mass spectrometer which comprises a nebulizer that receives the non-gaseous sample to provide a fine spray of the sample, a converter that receives at least a portion of said fine spray and converts the desired elements to the predetermined gaseous form and a flow line that transports the predetermined gaseous form to the accelerator mass spectrometer.

Sample introduction interface for analytical processing

An interface system for introducing a non-gaseous sample as a predetermined gaseous form into an analytical instrument which comprises a substrate that receives the non-gaseous sample and a directed energy source that heats at least a portion of said substrate containing the non-gaseous sample to convert the sample to the predetermined gaseous form.

Sample introduction interface for analytical processing of a sample placed on a substrate

A method and apparatus for ion beam generation in which acceleration of an ion beam in a first accelerating tube to a high voltage terminal, followed by transport of the beam through the terminal without significant charge changing, and deceleration of the beam substantially to ground potential in a second accelerating tube. Since the terminal is maintained at high voltage, the beam optical characteristics between the ion source and the terminal are identical to those of normal tandem operation. The optical elements of the injector and accelerator beamline can therefore be adjusted to produce an focused beam envelope in the high voltage terminal, allowing the beam to propagate efficiently through an empty stripper canal. Since the beam, does not undergo a charge change in the terminal, it is decelerated in the second tandem accelerating tube. Since the beam propagates through the accelerator at energies higher than the injection energy, expansion of the beam due to space charge and emittance is reduced.

Method and apparatus for ion beam generation

A miniature x-ray unit includes a first electrical node, a second electrical node and an insulating material. The first and second nodes are separated by a vacuum gap. The first node includes a base portion and a projecting portion, wherein the projecting portion and the second node are surrounded by an x-ray transmissive window through which x-rays exit the unit. The insulating material coaxially surrounds the base portion of the first node such that the insulating material is recessed from the vacuum gap, and the insulator does not extend into the vacuum gap. Recessing the insulating material from the vacuum gap decreases the likelihood that the insulator will electrically break down due to the accumulation of electrical charge, and/or the accumulation of other materials on the surface of the insulator. In a preferred embodiment, the first node is an anode and the second node is a cathode. Alternatively, the first node may be the cathode and the second node may be the anode. The cathode is preferably a cold gated field emitter array (FEA) which provides a electron current having a magnitude that is sufficient to satisfy the time constraints on x-ray dose delivery.

Miniature x-ray unit

An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.

Ion implantation system for implanting workpieces

A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion chamber generating a stream of ions, a plasma electrode having an elongated slot with a high aspect ratio for shaping the stream of ions into a ribbon beam, and an electrode assembly for directing the stream of ions towards a workpiece. The plasma electrode can include a split extraction system having a plurality of elongated slots oriented substantially parallel to each other. The ion implantation system can also have a diffusing system for homogenizing the ion stream. Various exemplary diffusing systems include an apertured plate having an array of openings, diffusing magnets, diffusing electrodes, and dithering magnets.

Large area uniform ion beam formation

A target is bombarded with high energy particles to generate a radioisotope, and the radioisotope is preferably extracted by one of the following: combusting the target in oxygen, stopping the bombardment and heating the target, or heating the target by induction. Bombardment may take place through a windowless path, and the radioisotope may be used for PET. The particles used may be deuterons or protons, and .sup.13 N may be generated. .sup.11 C may also be generated from either .sup.11 B or .sup.10 B using protons or deuterons. Combustion may be performed by induction heating and may be controlled by the quantity of oxygen available or the temperature. Combustion may be primarily confined to a surface layer and the target may be reused. The beam energy may be 2.2 MeV or less. Another general aspect includes trapping the oxides of .sup.13 N in a trap. The oxides may be converted into .sup.13 N-Ammonia, and this conversion may take place in the trap, which trap may comprise silica gel and sodium hydroxide and may also contain a reducing agent such as Raney-Nickel.

Method for producing radioisotopes

This invention relates to a method and apparatus for the generation of isotopes, and in particular radioisotopes, from a target material which is not normally a solid and which, when bombarded by selected high energy particles, produces the selected isotope. A surface is provided which is preferably of a thermally-conductive material, which surface is cooled to a temperature below the freezing temperature of the target material. A thin layer of target material is then frozen on the surface and the target material is bombarded with the high energy particles. The beam of high energy particles is preferably at an angle to the surface such that the particles pass through a thickness of the target material greater than the thickness of the layer before reaching the surface. When the desired quantity of isotope has been produced from the target material, the target material, which has now been altered nuclearly to contain the selected isotope, is removed from the surface. The target material may be melted or sublimated to facilitate extraction or extraction may be accomplished in some other way. For the preferred embodiment, the target surface is the interior surface of a cone.

Method and apparatus for generating isotopes

Window constructions for use in particle accelerators to separate an evacuated accelerator beam chamber from a gas or liquid filled target area, which window structure enhances cooling of the foil covering the window opening and reduces stresses on the foil. For preferred embodiments, the window opening is shaped and dimensioned to provide high length-to-width aspect ratio and a rectangular shape with rounded corners. The openings should generally be as narrow as possible while still being wide enough to assure efficient transmission of the ion beam. Stresses in the foil is reduced by providing controlled bowing of the portions of the foil covering the window. This may be accomplished by providing some slack in the foil, at least in one dimension, but is preferably accomplished by pressing the foil between mating curved surfaces selectively extending from the edges of the window openings, resulting in the desired bow in the foil in the window area. With a rectangular opening, the bow is preferably a generally cylindrical bow about an axis parallel to the length dimension of the window. A generally spherical bow may also be utilized. A plurality of adjacent generally rectangular openings separated by struts are also utilized for some embodiments.

Growing community of inventors

Lexington, MA, United States of America

Barbara J Hughey