Beijing Naura Microelectronics Equipment Co., Ltd.

Baogang Xu

Jun Zhang

Henan Zhang

Boyu Dong

Bingliang Guo

Xuewei Wu

Shaohui Liu

Ming Wang

Tong Wang

Jinrong Zhao

Wen Tao Zhang

Huaichao Ma

Yujie Geng

Kangning Zhao

Qingxuan Wang

Yaxin Cui

The present disclosure provides a loading apparatus and a physical vapor deposition (PVD) apparatus. The loading apparatus includes a pedestal configured to support a workpiece; and a first support member placed on the pedestal and configured to push up a cover ring when the pedestal is at an operation position to prevent an overlapping portion of a cover ring and the workpiece from contacting each other. In the loading apparatus and the PVD apparatus, the first support member supports the cover ring, such that the cover ring does not contact the workpiece, thereby reducing stress forces on the workpiece by external components.

Loading apparatus and physical vapor deposition apparatus

The present disclosure provides a deposition apparatus, including a first chamber, a second chamber and a third chamber. The first chamber is configured to load a substrate. The second chamber is configured to provide a high temperature environment in which a degas process and a sputtering process are performed on the substrate. The third chamber is provided between the first chamber and the second chamber. The third chamber is configured to transfer the substrate from the first chamber to the second chamber via the third chamber.

Deposition apparatus and physical vapor deposition chamber

A heating device and a heating chamber are provided, comprising a base plate (), at least three supporting columns () and a heating assembly, where the at least three supporting columns are arranged vertically on the base plate and are distributed at intervals along a circumferential direction of the base plate Top ends of the at least three supporting columns form a bearing surface for supporting a to-be-heated member (). The heating assembly includes a heating light tube () and a thermal radiation shielding assembly, where the heating light tube is disposed above the base plate and below the bearing surface. A projection of an effective heating area formed by uniform distribution of the heating light tube on the base plate covers a projection of the bearing surface on the base plate. The thermal radiation shielding assembly shields heat radiated by the heating light tube towards surroundings and bottom.

Heating device and heating chamber

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Beijing, China

Baogang Xu