Samsung Electronics Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Baik-Soon Choi

Jin-Man Kim

Hun Cha

Eun-Hee Shin

Yong-il Kim

Seung-Hyun Ahn

Sang-Tae Kim

Ahn-Ho Lee

Shi-Jin Sung

Kyong-Ho Lee

In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of &#x3b3;-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.

Methods of forming a photosensitive film

An inductive-coupled plasma apparatus employs a shield to reduce sputter contamination. A method for manufacturing the shield is included. An apparatus for generating a high-density plasma includes a process chamber having a dielectric window located along a plane, a coil located outside the process chamber proximate to the dielectric window and substantially parallel to the plane, and a shield located between the coil and the dielectric window. The shield has multiple openings, wherein the multiple openings of the shield are disposed at locations corresponding to areas between the turns of the coil.

Method for manufacturing a shield for an inductively-couple plasma apparatus

Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield

Growing community of inventors

Gyeonggi-do, South Korea

Baik-Soon Choi