3m Innovative Properties Company

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3m Innovative Properties

3m Innovation Properties Company

Babu Nana Gaddam

Kevin Michael Lewandowski

Duane Douglas Fansler

Larry R Krepski

Steven M Heilmann

Michael S Wendland

Ahmed Salih Abuelyaman

Maureen Ann Kavanagh

Hae-Seung Harry Lee

Stephen B Roscoe

Guy D Joly

Joon Chatterjee

Kelly S Anderson

Jason D Clapper

Todd D Jones

Serkan Yurt

Ann R Fornof

Timothy D Filiatrault

George W Griesgraber

Peiwang Zhu

Marie Aloshyna Ep Lesuffleur

Joel D Oxman

Wayne Scott Mahoney

Naimul Karim

Arlin Lee Weikel

David J Plaut

Jerald K Rasmussen

William H Moser

Eugene G Joseph

Afshin Falsafi

Jitendra Singh Rathore

Belma Erdogan-Haug

John L Battiste

Sumita Basu Mitra

Bradley Dene Craig

Robert T Fitzsimons, Jr

Catherine A Bothof

Richard B Ross

Stefan H Gryska

Prabhakara Satyauolu Rao

Jingjing Ma

Mark F Ellis

Simon Kelly Shannon

Bryan T Whiting

James M Nelson

Ying-Yuh Lu

Dennis Edward Vogel

Alphonsus V Pocius

Sanat Mohanty

Gregg Alexander Caldwell

David B Olson

Jayshree Seth

Peter Bissinger

Wendy L Thompson

Adrian S Eckert

Ross E Behling

Ilya Gorodisher

Kathleen S Shafer

Timothy D Dunbar

Vivek Bharti

Chuntao Cao

Hoa T Bui

John J Cael

Brant Ulrick Kolb

Mieczyslaw H Mazurek

Richard G Hansen

Joseph D Rule

Robert A Asmus

David S Hays

Dong-Wei Zhu

Junkang Jacob Liu

Scott A Burton

David James Yarusso

Ryan E Marx

Rajdeep S Kalgutkar

James P DiZio

John J Stofko, Jr

Jonathan E Janoski

Nathan E Schultz

Jay M Jennen

Steven D Theiss

Michael John Annen

Christopher J Campbell

Jianhui Xia

Janet A Venne

Brian N Holmes

Joan V Brennan

Corinne Elizabeth Lipscomb

David S Arney

Zhong Chen

Peter M Olofson

Siegfried Rainer Goeb

Leon Levitt

Mary M Caruso Dailey

Richard E Bennett

Haeen Sykora

John R Jacobsen

Michael Govek

Ming Cheng

Michael L Ruegsegger

An adhesion promoter comprises a reaction product of: a) a polyepoxide; b) an aminosilane represented by the formula HNRR. Rand Rindependently represent &#x2014;Z&#x2014;SiL. Each Z independently represents a divalent linking group having from 1 to 12 carbon atoms, and each L independently represents a hydrolyzable group; and c) an isocyanatosilane represented by the formula O&#x2550;C&#x2550;N&#x2014;Z&#x2014;SiL, wherein Z and L are as previously defined. The adhesion promoter may be used to treat a surface of a substrate such as an abrasive particle, which may be included in a resin-bond abrasive article.

Method of treating a surface, surface-modified abrasive particles, and resin-bond abrasive articles

Controlled radical initiators, reaction mixtures containing the controlled radical initiators and various ethylenically unsaturated monomers, polymeric materials formed from the reaction mixtures, crosslinkable compositions containing the polymeric materials, crosslinked compositions formed from the crosslinkable compositions, and articles containing the polymeric materials, the crosslinkable compositions, or the crosslinked compositions are provided. The controlled radical initiators are bis-dithiocarbamate or bis-dithiocarbonate compounds having a single carbon between the two dithiocarbamate or dithiocarbonate groups. Also attached to that single carbon is a ketone group.

Polymeric materials formed using initiators with two thiocarbonylthio-containing groups

First articles with covalently attached thiocarbonylthio-containing groups are provided. More specifically, the first articles are a functionalized substrate that contains a solid polymeric substrate with a plurality of thiocarbonylthio-containing groups covalently attached directly to carbon atoms in a polymeric backbone of the solid polymeric substrate. Methods of making the first articles with covalently attached thiocarbonylthio-containing groups are provided. Additionally, second articles and methods of using the first articles to generate second articles with covalently attached polymeric chains are provided.

Polymeric substrates with attached thiocarbonylthio-containing groups

Controlled radical initiators, reaction mixtures containing the controlled radical initiators and various ethylenically unsaturated monomers, polymeric materials formed from the reaction mixtures, crosslinkable compositions containing the polymeric materials, crosslinked compositions formed from the crosslinkable compositions, and various articles are provided. The controlled radical initiators are bis-dithiocarbamate or bis-dithiocarbonate compounds having a carbonyl group between the two dithiocarbamate or dithiocarbonate groups.

Polymeric materials formed using initiators with a ketone group and two thiocarbonylthio-containing groups

Novel stress-reducing crosslinking oligomers that have application in dental restoratives, thin films, hardcoats, composites, adhesives, and other uses subject to stress reduction are described. The addition-fragmentation process of crosslinking results in a chain-transfer event that provides novel polymers that may be further functionalized. In addition, the addition-fragmentation oligomer comprises pendent functional groups that bond to a substrate by forming an ionic or covalent bond, or etch the substrate by chemically removing some material from the substrate.

Addition-fragmentation oligomers

Controlled radical initiators that are ketone-containing dithiocarbamate or ketone-containing dithiocarbonate compounds are used to form polymeric materials that have a single polymeric block or multiple polymeric blocks. Reaction mixtures containing controlled radical initiators and various ethylenically unsaturated monomers, polymeric materials formed from the reaction mixtures, crosslinkable compositions containing the polymeric materials, crosslinked compositions formed from the crosslinkable compositions, and articles containing the polymeric materials, the crosslinkable compositions, or the crosslinked compositions are provided.

Ketone-containing controlled radical initiators for polymerization reactions

Crosslinkable polymeric materials, crosslinked polymeric materials, articles containing the crosslinkable polymeric materials or crosslinked polymeric materials, and methods of making the articles and various compositions are provided. More particularly, the crosslinkable composition contains a) a first polymeric material, which has terminal dithiocarbamate or dithiocarbonate groups, b) a crosslinking composition containing a chlorinated triazine crosslinking agent and/or a crosslinking monomer having two or more ethylenically unsaturated groups, and c) a thixotropic agent containing metal oxide particles. The crosslinkable composition may be printable or dispensed. In some embodiments, the crosslinked composition is a pressure-sensitive adhesive.

Polymeric compositions prepared with a controlled radical initiator

Silicone-based elastomeric materials, articles containing the silicone-based elastomeric materials, reaction mixtures used to form the silicone-based elastomeric materials, and methods of making the silicone-based elastomeric materials are described. The silicone-based elastomeric materials are prepared by polymerizing silicone compounds having at least two ethylenically unsaturated groups in the presence of actinic radiation and a controlled radical initiator. The controlled radical initiators are bis-dithiocarbamate or bis-dithiocarbonate compounds having a single carbon between the two dithiocarbamate or dithiocarbonate groups. The silicone-based elastomeric materials typically have improved mechanical properties compared to silicone-based elastomeric materials formed by free radical polymerization reactions in the presence of conventional photoinitiators.

Photo-radical cure of silicones

Silicone-based pressure-sensitive adhesives, reaction mixtures used to form the pressure-sensitive adhesives, methods of making the silicone-based pressure-sensitive adhesives, and articles containing the silicone-based pressure-sensitive adhesives are described. More particularly, the silicone-based pressure-sensitive adhesives include silicone-based elastomeric materials that are prepared by polymerizing a silicone compound having at least two ethylenically unsaturated groups in the presence of actinic radiation (e.g., ultraviolet radiation) and a controlled radical initiator. The controlled radical initiator is a bis-dithiocarbamate or bis-dithiocarbonate compound having a single carbon between the two dithiocarbamate or dithiocarbonate groups.

Silicone-based pressure-sensitive adhesive

A pattern article comprising a copolymer having polymerized units derived from a cleavable crosslinking monomer, to which a pattern is imparted by the release of incipient acid from a thermal acid generator or photoacid generator. The selective release of the acid provides a pattern of high crosslink density and low crosslink density as result of the incipient acid cleaving a portion of the crosslinks.

Patterned film article comprising cleavable crosslinker and methods

Crosslinkable compositions are provided that contain a) a polymeric material having at least two terminal dithiocarbamate groups or two terminal dithiocarbonate groups and b) a monomer composition that includes at least a crosslinking monomer having two or more ethylenically unsaturated groups. The polymeric materials in the crosslinkable compositions undergo chain extension and crosslinking reactions when exposed to actinic radiation in the ultraviolet region of the electromagnetic spectrum. Additionally, crosslinked compositions, articles that contain the crosslinkable compositions or the crosslinked compositions, and methods of making the articles are provided.

Crosslinkable and crosslinked polymeric materials

Controlled radical initiators, reaction mixtures containing the controlled radical initiators and various ethylenically unsaturated monomers, polymeric materials formed from the reaction mixtures, crosslinkable compositions containing the polymeric materials, and crosslinked compositions formed from the crosslinkable compositions are provided. The controlled radical initiators are bis-dithiocarbamate or bis-dithiocarbonate compounds having a single carbon between the two dithiocarbamate or dithiocarbonate groups.

Polymeric materials formed using controlled radical initiators

Controlled radical initiators, reaction mixtures containing the controlled radical initiators and various ethylenically unsaturated monomers, and polymeric materials formed from the reaction mixtures are provided. The controlled radical initiators are bis-dithiocarbamate or bis-dithiocarbonate compounds with a single carbon atom between the two dithiocarbamate or dithiocarbonate groups. Polymeric materials such as homopolymers, random copolymers, and block copolymers can be prepared using the controlled radical initiators.

Polymeric material and methods of making using controlled radical initiators

A pressure sensitive adhesive composition is described comprising at least one low Tg (meth)acrylic polymer, and at least one silsesquioxane polymer crosslinker comprising a plurality of ethylenically unsaturated groups. The low Tg (meth)acrylic polymer typically has a Tg no greater than 10&#xb0; C. In some embodiments, the low Tg (meth)acrylic polymer comprises at least 50, 55, 60, 65, or 70 wt-% of polymerized units derived from low Tg ethylenically unsaturated monomer(s). The low Tg ethylenically unsaturated monomer(s) is typically an alkyl (meth)acrylate comprising 4 to 20 carbon atoms. Also described are pressure sensitive adhesive articles and methods of preparing such articles.

Adhesive compositions comprising a silsesquioxane polymer crosslinker, articles and methods

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Woodbury, MN, United States of America

Babu Nana Gaddam