Obducat Ab

Obducat Aktiebolag

Obducat

Babak Heidari

Marc Beck

Matthias Keil

Lennart Olsson

Jakob Nilsson

Lars Montelius

Torbjörn Ling

Göran Frennesson

Erik Theander

Erik Bolmsjö

Johan Ring

Göran Larsson

Anette Löfstrand

Helena Eleonora Benedihta Riddargrip Beck, Legal Representative

Mattias Habenicht

Thord Stjernholm

Rizgar Nabi Jiawook

Erik Ehrenborg

A demolding device for use in an imprint machine, in which a foil is intermittently passed in a feed direction over a press region where a stamp is pressed against the foil for imprinting a surface pattern. The demolding device includes a carrier, a pressing roller mounted in the carrier, and a demolding roller mounted parallel to the pressing roller in the carrier, wherein the carrier is configured to slide over the press region against the feed direction while rolling the foil under the pressing roller and over the demolding roller for detaching the foil from the stamp after imprinting of the pattern.

Mounting and demolding device

The invention to provide curable materials, comprising photo-reactive compounds, in particular, photoinitiators and polymerizable mono- or multifunctional monomers such as acrylates or epoxides. The material may also contain fluoro-surfactants completely or partly terminated by functional groups with the ability to bind covalently to said chemical composition under curing. The curable compositions are either purely acrylate based or a hybrid of different types of monomers such as acrylates, epoxides or vinyl ethers. The polymerizable monomers may cure with the use of different types of photoinitiator, such as free radical photoinitiators or cationic photoinitiators, ultimately forming a hybrid resist comprising interpenetrating networks of different types of monomers e.g. acrylates and epoxides. The acrylate/epoxide hybrid system has showed improved replication properties in terms of high nano-imprint lithography process fidelity, due to increased conversion of acrylates and low shrinkage.

Methods and processes for modifying polymer material surface interactions

The invention provides a modification of a polymer film surface interaction properties. In this process a polymer carrier object is covered by a chemical composition, comprising photo-polymerizable compounds, photo-initiators or catalysts with the ability to initiate polymerization and semi-fluorinated molecules. The so-produced polymer mold contains semi-fluorinated moieties, which are predominantly located on the surface and on the surface near region of the patterned surface. The polymer mold is suitable as a template with modified properties in a nano-imprint lithography process.

Process and method for modifying polymer film surface interaction

The present invention relates to a nano imprint method and to a nano imprint apparatus comprising: a first imprint module, a second imprint module, a storage and a feeder module, wherein; the first imprint module is adapted to imprint a pattern into an intermediate polymer stamp from a template; a second imprint module is adapted to imprint a pattern into a substrate from the intermediate polymer stamp; robot feeder modules are adapted to move the template, intermediate polymer stamp and the substrate from and to storages.

Nano imprinting method and apparatus

Apparatus and method for transferring a pattern from a template () having a structured surface to a substrate () carrying a surface layer of a radiation polymerisable fluid (). The apparatus comprises a first main part () and a second main part () having opposing surfaces (), means for adjusting a spacing () between said main parts, support means () for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source () devised to emit radiation into said spacing. A cavity () has a first wall comprising a flexible membrane () devised to engage said template or substrate, and means () are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.

Device and method for large area lithography

The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected front the group consisting of phosphonic acids, phosphinic acids, phosphonates and phosphonate salts, phosphinates and phosphinate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain. 

Metal mold for use in imprinting processes

Apparatus and method for transferring a pattern from a template () having a structured surface to a substrate () carrying a surface layer of a radiation polymerisable fluid (). The apparatus comprises a first main part () and a second main part () having opposing surfaces (), means for adjusting a spacing () between said main parts, support means () for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source () devised to emit radiation into said spacing. A cavity () has a first wall comprising a flexible membrane () devised to engage said template or substrate, and means () are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer ().

Device and method for lithography

Method for transferring a pattern from a template () having a structured surface () to a substrate () carrying a surface layer () of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tby means of a heater device (); and while maintaining said temperature T, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation () for solidifying the layer, and&#x2014;postbaking the layer.

Method for imprint lithography at constant temperature

A method is provided for transferring a pattern from a template () to an object () in an imprint process, using a two-step process. The first step includes contacting a pattern of the template surface with a polymer material comprising one or more Cyclic Olefin Copolymers (COCs), to produce a flexible polymer replica having a structured surface with an inverse of the pattern of the template surface. In a second step, after releasing the flexible polymer replica from the template, the inverse pattern of the flexible polymer replica is pressed into a resist layer on a substrate, to imprint a replica of the pattern of the template surface in therein.

Imprint stamp comprising cyclic olefin copolymer

The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected from the group consisting of phosphonic acids, phosphonic acids, phosphonates and phosphonate salts, phosphonates and phosphonate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain.

Modified metal mold for use in imprinting processes

The invention relates to a two-step process for transferring a pattern from a template () to a target surface of a substrate, by creating an intermediate flexible polymer stamp () from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.

Pattern replication with intermediate stamp

An apparatus and method are provided for separating two objects attached to each other in a sandwich structure, such as a stamp and a substrate pressed together in an imprint process. The apparatus includes a support structure, carrying first fastening means having a base surface and first gripping means for supporting and holding a first object, second fastening means, positioned opposite to the first fastening means, having second gripping means for holding a second object, and a pulling force mechanism to provide a pulling force at an angle to the normal direction of the base surface for displacing the two fastening means away from each other. Preferably, the second object is gripped at a periphery portion, and the pulling force is angled inwardly from said periphery portion.

Separation apparatus and method

Device in connection with the lithography of structures of nanometer size, which device comprises a first main part () with a first principally plane surface () and a second main part () with a second principally plane surface (), said first surface and second surface being opposite to one another and being arranged in principle parallel in relation to one another, with an adjustable interval between them, and said first and second surface being arranged to form a support for a substrate () and a template () respectively, or vice-versa. According to the invention, said second main part () also comprises a cavity () for a medium, and means for adjusting a pressure of said medium, a wall of said cavity consisting of a flexible membrane (), of which one side, which side faces away from the cavity (), forms said second surface (). The invention also relates to a method that utilizes the device.

Device and method in connection with the production of structures

A device is provided for transferring a pattern to an object. The device may be used for transferring a pattern, such as micro- or nanostructures, from a stamp to an object. In accordance with one embodiment, the device comprises a first contacting means with a receiving surface for the stamp and a second contacting means with a receiving surface for the object. The device may further include a pressing means that is adapted to operate at least one of the contacting means for contacting the stamp with the object. One of the contacting means may include a base and a holder. The holder has a first end which defines one of the receiving surfaces and a second opposite end which is pivotally connected to the base in such a manner that the stamp and the object are automatically placed in a parallel position when contacting each other.

Device for transferring a pattern to an object

A stamp for use in transferring a pattern in nano-scale has a monomolecular antisticking layer. The anti-sticking layer comprises molecular chains, which are covalently bound to the surface of the stamp and which each comprise at least one fluorine-containing group. Each molecular chain contains a group Q, which comprises a bond which is weaker than the other bonds in the molecular chain as well as the covalent bond that binds the molecular chain to the surface of the stamp. Splitting of said bond in the group Q creates a group Q1, which is attached to the part of the molecular chain being left on the surface of the stamp and which is capable of reacting with a fluorine-containing compound to restore the antisticking layer. In a method of manufacturing a stamp for use in transferring a pattern in nanoscale, the stamp is provided with the above-mentioned molecular chain. In a method of repairing a damaged antisticking layer of the above-mentioned stamp, the stamp is treated with a repairing reagent, which has a coupling end, which is capable of reacting with the group Q1, and a fluorine-containing group located at the other end of the repairing reagent.

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Furulund, Sweden

Babak Heidari