Taiwan Semiconductor Manufacturing Comp. Ltd.

B J Chang

Kuo-Liang Lu

Kuo Liang Lu

Wen-Hsiang Tseng

Nai Huai Liu

A wet chemical process tank for processing semiconductor wafers equipped with a specially designed fluid dispenser positioned at the bottom of the tank where the dispenser has a fluid dispensing member having an elongated body connected on at least one end to at least one support member for stabilizing the member and a fluid passage therein in fluid communication with a plurality of openings provided on at least one of the vertical sides of the member such that a fluid may only exit the member in a horizontal direction so that bubbles generated do not directly contact the semiconductor wafers suspended at the center of the tank.

Fluid dispensing device for wet chemical process tank and method of using

A wet chemical treatment system for processing semiconductor wafers that does not have the problem of cracking or other damages occurring in the system during a cleaning process where a strong acid and water are mixed and pressure and heat are generated. The system includes an additional filing system such that only an outer tank for the processing liquid is filled after the system is cleaned so that pressure and heat generated by the reaction between acid and water can be released into an empty inner tank and thus avoiding damages caused by the heat and pressure. A method for cleaning such system is further disclosed.

Growing community of inventors

Hsin-Chu, Taiwan

B J Chang